The preparation of the multilayered structure of metal-dielectric films is investigated and the microwave absorbing capability of the structure has been measured in a series of experiments. By electron beam vapor deposition, the Fe/SiO 2 films have been successfully prepared, and then the electromagnetic scattering properties of the films have been measured by standard method. The result shows that the multilayered structure of Fe/SiO 2 films has obvious microwave absorbing capability, and some pivotal orders are achieved which provides a theoretical foundation to further improve the microwave absorbing capability of the metallic nanofilms.

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