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Nanostructured mental-semiconductor-mental photodetectors (MSM-PDs) can assist in future high-speed communication devices for achieving high responsivity characteristics. However, such devices suffer from low responsivity due to low absorption, and the large band gap limits its detection range. Herein, we propose a GaAs-based photodetector with enhanced photoresponse by plasmonic Au-GaAs grating structure. The design of a grating structure on the surface of n-GaAs can excite a plasmon mode to enhance the photoelectric performance of photodetectors. Consequently, under 795 nm incident light irradiation, the grating hybrid detector exhibits a nearly 4.2-fold increase in photocurrent compared to the bare GaAs device. The enhanced absorption can be up to 99% and a specific responsivity of 240 mA/W is realized. These results can thus provide a potential scheme to fabricate high-performance GaAs detector for numerous applications.