This article describes an experiment on the deposition of oxide coatings on silicon and metal substrates from a gasmetal plasma. The plasma was produced by e-beam evaporation of metals (Mg, Al) with subsequent ionization of gas (oxygen) and evaporated material particles at fore-vacuum (1-10 Pa) pressures. We studied the ion composition and species fraction in the gas-metal plasma (using quadruple mass-spectrometry), as well as the thickness and surface resistivity of the coatings. Keywords: fore-vacuum, plasma-cathode electron source, coating deposition. doi: 10.21293/1818-0442-2016-19-4-10-12 A gas-metal plasma is a plasma containing ions of both gaseous and metallic species with controlled relative content. Such plasmas are of paramount interest for the deposition of nitride [1] and oxide [2] films and complex composite structures [3] on the surfaces of chosen substrates. Gas-metal plasmas for technological applications are routinely produced using arc discharges with added gas flow, or a magnetron discharge in selfsputtering mode. In recent work we have demonstrated the advantages of using a fore-vacuum pressure, plasma-cathode, electron beam source [4][5][6][7] for various applications including the generation of gas-metal plasmas by electron beam evaporation of metals in oxygen for the deposition of oxide coatings [8]. Here we describe our further research on the features of gas-metal plasmas at fore-vacuum pressures and the properties of deposited coatings.