The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p -type diamond (the concentration ~10^20 cm^–3) in CH_4 + Ar plasma is conducted. The deposition rate is 7 nm min^–1. The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm^–3, and exhibit an ultrasmooth surface (with a roughness of 0.4 ± 0.2 nm).

In this paper describes the process of manufacturing ohmic contacts to diamond-like carbon (DLC) layer by depositing of Au/Mo/Ti metal layers. Contacts had good mechanical and adhesive properties. Their contact resistivity ranged from 1.4 ∙ 10-4 to 6.4 ∙ 10-5 Ohm ∙ cm2 depending on the DLC layer thickness. The temperature dependence of the films sheet resistance was studied. It is shown that thin DLC layers provide better ohmic contact characteristics due to their more uniform graphitization during thermal annealing.