A high-resolution laboratory reflectometer designed for operation in the soft x-ray (SXR) and extreme ultraviolet (EUV) ranges is described. High spectral resolution, up to 0.028 nm, in a wide spectral range is achieved due to the Czerny–Turner monochromator. A laser plasma generated by irradiating a solid-state target with a focused laser beam (wavelength 1.06 µm, pulse energy 0.5 J, duration 4 ns, and pulse repetition rate 10 Hz) is used as a source of SXR and EUV radiation. The goniometer allows the study of curved optical elements with an aperture up to NA = 0.5 and a diameter of up to 500 mm. The methods providing high efficiency of the optical system and spectral resolution in a wide range of wavelengths are described in detail. The problem of taking into account high orders in the recorded spectra of a laser plasma is discussed. A comparison of the measurement results with the described reflectometer and the optics beamline at the BESSY-II synchrotron is given.

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The results of an investigation on oxidation processes in Mo/Be multilayer nanofilms are presented. The films annealed both in ambient atmosphere and in vacuum. The extreme ultraviolet (EUV) and X-ray reflectivity of the samples at 11.34 and at 0.154 nm respectively were measured before and after the treatment. No noticeable changes in film thicknesses and boundaries were observed during the annealing at temperatures up to 300°C. An oxidation mechanism of the nanofilms Mo/Be is established and the activation energy of the oxidation process is estimated to be 38 kJ/mol. To determine an absolute quantity of oxygen in the oxidized layers, a simple technique based on the EUV reflectivity data is proposed, and the range of its applicability is subsequently analysed.

Broadband Mo/Be multilayer structures were designed for maximum uniform normal-incidence reflectivity in a broad range of 111–138 Å, which lies near and beyond the L2,3 absorption edge of Si. A comparison was made of the capabilities of two classes of aperiodic structures and of so-called “stack” structures, which are composed of several periodic structures with different periods stacked one over the other. Six-stack Mo/Be 80-layer structures were synthesized on concave (R = 1 m) superpolished fused silica substrates. Their absolute reflectivity was measured at 13% – 14% in the 111–138 Å optimization range using a laboratory reflectometer with a laser-plasma radiation source. The normal-incidence reflection spectra of the mirrors were recorded in the configuration of a transmission-grating spectrograph using the slowly varying quasicontinuum of a laser-driven tungsten plasma. Comparing the reflectivity data with the reflection spectra recorded with a CCD permitted estimating a decrease in the detector responsivity beyond the Si L-edge. The broadband normal-incidence multilayer mirrors facilitate the development of a high-resolution imaging spectrograph covering a usable range about the Si L-edge to characterize, for instance, the L-edge fine structures and chemical states. These mirrors will also find use in imaging solar instruments with a high spectral resolution operating aboard a spacecraft and in laboratory instruments for plasma diagnostics.

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