It is well known that bulk Pd-Ni-P metallic glass with a wide range of compositions (Pd: 25-60 at%; Ni: 20-57 at%; P 16-22 at%) can be prepared. In the present study, we investigated the method of production of electrodeposited Pd-Ni-P metallic glass films whose composition range is the same as that of bulk Pd-Ni-P metallic glass. The composition of electrodeposited Pd-Ni-P films were controlled by adjusting the concentrations of PdCl 2 , NiSO 4 ·6H 2 O and H 3 PO 3 in the Pd-Ni-P bath. X-ray diffraction patterns and transmission electron microscopy images showed that the electrodeposited Pd-Ni-P films were amorphous. The results of differential scanning calorimetry indicated that the electrodeposited Pd-Ni-P films were metallic glass with Pd, Ni, and P compositions of 36-57 at%, 25-43 at%, and 17-20 at%, respectively, which were almost identical to those in bulk Pd-Ni-P metallic glass. Furthermore, we succeeded in producing a Pd 42 Ni 37 P 21 metallic glass film by electrodeposition. The alloy composition of this film was very similar to that of Pd 40 Ni 40 P 20 , which is one of the best bulk metallic glasses because of its glass forming ability (GFA) .
Crystallization behavior of electrodeposited Pd-Ni-P metallic glass films in the supercooled liquid region was investigated. The Pd 40 Ni 40 P 20 , which has the highest glass formability, and other metallic glass Pd 44 Ni 39 P 17 and Pd 41 Ni 42 P 17 were prepared. The crystallization temperature (T x ) of Pd 44 Ni 39 P 17 and Pd 41 Ni 42 P 17 were lower than that of Pd 40 Ni 40 P 20 by differential scanning calorimetry (DSC) analysis. X-ray diffractometry (XRD) patterns show that all samples were crystallized after isothermal annealing below T x . The Pd 5 P 2 and Ni 3 P were observed using XRD analysis after annealing of Pd 40 Ni 40 P 20 and Pd 44 Ni 39 P 17 at 603 K for 60 min and 30 min, respectively. Furthermore, in Pd 44 Ni 39 P 17, the Pd 2 Ni 2 P was observed after annealing at 603 K for 120 min.
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