2016
DOI: 10.1016/j.solmat.2016.05.046
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0.76% absolute efficiency increase for screen-printed multicrystalline silicon solar cells with nanostructures by reactive ion etching

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Cited by 42 publications
(13 citation statements)
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“…Scalable fabrication of b‐Si at a low cost is critical for industrial applications in silicon solar cells but remains a major challenge. Over the past decades, reactive ion etching, [ 23–27 ] electrochemical etching, [ 28–30 ] laser micro structuring, [ 15,31–34 ] and metal‐assisted chemical etching (MacEtch or MACE), [ 16,17,35–41 ] have been developed for the micro/nanostructuring of silicon surfaces for b‐Si fabrication. To date, one of the strongest trends in b‐Si production is the utilization of metal‐catalyzed etching of silicon in oxidizing HF solutions owing to the following advantages: simplicity, rapidity, versatility, and scalability.…”
Section: Introductionmentioning
confidence: 99%
“…Scalable fabrication of b‐Si at a low cost is critical for industrial applications in silicon solar cells but remains a major challenge. Over the past decades, reactive ion etching, [ 23–27 ] electrochemical etching, [ 28–30 ] laser micro structuring, [ 15,31–34 ] and metal‐assisted chemical etching (MacEtch or MACE), [ 16,17,35–41 ] have been developed for the micro/nanostructuring of silicon surfaces for b‐Si fabrication. To date, one of the strongest trends in b‐Si production is the utilization of metal‐catalyzed etching of silicon in oxidizing HF solutions owing to the following advantages: simplicity, rapidity, versatility, and scalability.…”
Section: Introductionmentioning
confidence: 99%
“…A rich variety of optical structures can increase the transmittance property of the film, such as pyramid, inverted pyramid, sub-wavelength grating, nanowire array, biomimetic and so on (Chen and Hong, 2016;Haase and Stiebig, 2007;Esteban et al, 2010;Huang et al, 2012). For a randomly textured surface, the increased transmittance is explained by a second reflection of the incident light at the sidewalls.…”
Section: Resultsmentioning
confidence: 99%
“…Importantly, both isotropic and anisotropic etching profiles are obtainable in the process of the reactive ion etching which is thus serving as one of the most important etching techniques in device manufacturing. [ 43,44 ]…”
Section: Fabrication Of Well‐defined Nanostructuresmentioning
confidence: 99%