We epitaxially deposited a series of differently doped
(CaxLa1−x)(Ba1.75−xLa0.25+x)Cu3Oy
thin films by in situ dc magnetron sputtering. Samples with
x = 0.1
and 0.5 were prepared. The sputtering condition, annealling processes, and cooling
methods were carefully studied. A quenching method has been developed.
By using this method, a series of differently doped samples were routinely
obtained. The structures of the thin films were studied by x-ray diffraction with
θ–2θ, rocking
curve, and Φ
scans. The surface morphologies of the thin films were analysed by
atomic force microscopy. The study shows that the thin films are highly
c-axis oriented and constructed from three-dimensional stacking islands.