2000 IEEE International Solid-State Circuits Conference. Digest of Technical Papers (Cat. No.00CH37056)
DOI: 10.1109/isscc.2000.839831
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1 GHz fully pipelined 3.7 ns address access time 8 k×1024 embedded DRAM macro

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Cited by 6 publications
(6 citation statements)
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“…It seems likely that today's conventional DRAM will be embedded with microprocessors on the same chips and speeded up by utilizing the microprocessor devices and architectural improvements [87], while chips that perform only the memory function will continue to emphasize density, slower speed, and perhaps nonvolatility. Thus, DRAM may evolve in more than one direction in the future.…”
Section: A General Considerationsmentioning
confidence: 99%
“…It seems likely that today's conventional DRAM will be embedded with microprocessors on the same chips and speeded up by utilizing the microprocessor devices and architectural improvements [87], while chips that perform only the memory function will continue to emphasize density, slower speed, and perhaps nonvolatility. Thus, DRAM may evolve in more than one direction in the future.…”
Section: A General Considerationsmentioning
confidence: 99%
“…Throughput can be increased by employing high-speed memory (e.g., [17]) and high-speed I/O techniques (e.g., [18]) without the need to speed up the per-pixel ADCs, since their throughput scales linearly with array size. Fig.…”
Section: B Frame Ratementioning
confidence: 99%
“…(Recently, a multiple oxide thickness and dual supply voltage device approach has become popular in e-DRAMs to achieve high performance and low leakage power (Takahashi et al 2000).) As with joint device sizing and supply and threshold voltage optimization, GP-based design can be carried out with multiple doping concentrations, channel lengths and oxide thicknesses, because models of gate delay as a function of doping concentration, channel length, and oxide thickness, as well as the device width, supply, and threshold voltage, can be well approximated as generalized posynomials.…”
Section: P -P|mentioning
confidence: 99%