1 kA low-energy electron-beam source

Hamagaki, Manabu; Hara, Tamio; Sadamoto, Yoshiro; Ohgo, T.

doi:10.1063/1.1145454

Cited by 12 publications

(5 citation statements)

References 12 publications

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“…There are commercial products available that can be adjusted for various needs, for example, Spectra-Mat Inc, CA [11] manufactures electron and ion injectors based on hollow cathode plasma sources with a total electron emission current of ∼ 10 A. A 1 kA low energy electron-beam source based on a plasma emitter is described in [12]. For our specific requirements, among which are high perunit emission current (∼ 1 kA), small source size, and compatibility with fusion research grade plasmas, we had to design a novel plasma electron injector.…”

Section: The Plasma Sourcementioning

confidence: 99%

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High current plasma electron emitter

Fiksel

Almagri

Craig

et al. 1996

Plasma Sources Sci. Technol.

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A high current plasma electron emitter based on a miniature plasma source has been developed. The emitting plasma is created by a pulsed high current gas discharge. The electron emission current is 1 kA at 300 V with a pulse duration of 10 ms. The prototype injector described in this paper will be used for a 20 kA electrostatic current injection experiment in the Madison symmetric torus reversed-field pinch. The source will be replicated in order to attain this total current requirement. The source has a simple design and has proven to be very reliable in operation. A high emission current, small size (3.7 cm in diameter) and low impurity generation make the source suitable for a variety of fusion and technological applications.

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Section: The Plasma Sourcementioning

confidence: 99%

“…(The mean collision free path for a 200 eV electron in a 10 13 cm −3 background density is of the order of 10 3 cm). A similar terminology and approach is practised by authors of [12].…”

Section: The Plasma Sourcementioning

confidence: 99%

High current plasma electron emitter

Fiksel

Almagri

Craig

et al. 1996

Plasma Sources Sci. Technol.

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“…In the present study, a new NB source equipped with an electron-beam-excited plasma (EBEP) [19][20][21][22] has been developed. The EBEP source is able to produce a highdensity plasma at a pressure lower than 0.1 Pa. Sputtering etching of a Si wafer by an Ar NB has also been investigated.…”

Section: Introductionmentioning

confidence: 99%

Development of Neutral Beam Source Using Electron Beam Excited Plasma

Hara¹,

Hamagaki

Mise

et al. 2011

Jpn. J. Appl. Phys.

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A low-energy neutral beam (NB) source, which consists of an electron-beam-excited plasma (EBEP) source and two carbon electrodes, has been developed for damageless etching of ultra-large-scale integrated (ULSI) devices. It has been confirmed that the Ar ion beam energy was controlled by the acceleration voltage and the beam profile had good uniformity over the diameter of 80 mm. Dry etching of a Si wafer at the floating potential has been carried out by Ar NB. Si sputtering yield by an Ar NB clearly depends on the acceleration voltage. This result shows that the NB has been generated through the charge exchange reaction from the ion beam in the process chamber.

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“…High current low-energy electron beam sources based on plasma cathode emitters have been studied [12,13]. More recently, a microwave plasma cathode gun has also been developed, which produces a focused electron beam extracted from a medium-pressure discharge sustained by microwaves [14].…”

Section: Introductionmentioning

confidence: 99%

Extraction of large-area low-energy electron beams from a multi-dipolar plasma

Lacoste¹,

Béchu²,

Maulat³

et al. 2009

Plasma Sources Sci. Technol.

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Production of large-area low-energy electron beams extracted from low-pressure plasmas is investigated. In order to extract electron beams of given energy from a plasma, the plasma potential, as referred to the wall potential, must be stationary and independent of the extraction potential. Macroscopic neutrality of the plasma therefore requires that reactor walls are metallic and that the ratio of extraction area to reactor wall area is less than the square root of the ratio of electron to ion mass. These conditions are fulfilled in the source presented in this study where electrons are extracted from a multi-dipolar plasma sustained by microwaves at electron cyclotron resonance. Variations in plasma and beam potentials are measured by Langmuir probes as a function of the applied extraction voltage (0-200 V), showing that the electron energy varies according to the extraction potential. Electron source behavior and experimental results appear in good agreement with those expected from discharge balance calculations.

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1 kA low-energy electron-beam source

Cited by 12 publications

References 12 publications

High current plasma electron emitter

High current plasma electron emitter

Development of Neutral Beam Source Using Electron Beam Excited Plasma

Extraction of large-area low-energy electron beams from a multi-dipolar plasma

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