2021
DOI: 10.1016/j.microrel.2021.114249
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1200V 4H-SiC trench MOSFET with superior figure of merit and suppressed quasi-saturation effect

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Cited by 9 publications
(2 citation statements)
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“…The structure includes a trench gate with split-gate electrodes and a thicker P-Poly-Si layer, resulting in reduced gate charge and improved switching performance. To suppress the depletion layer, an n-type doped current spreading layer (N-CSL) is formed under the entire P-well region [24]. To maintain the breakdown voltage (BV) of the device structure while maintaining transfer and output characteristics similar to those of C-ATMOS [25][26][27], the depth of the P-well on the right side is not changed.…”
Section: Introductionmentioning
confidence: 99%
“…The structure includes a trench gate with split-gate electrodes and a thicker P-Poly-Si layer, resulting in reduced gate charge and improved switching performance. To suppress the depletion layer, an n-type doped current spreading layer (N-CSL) is formed under the entire P-well region [24]. To maintain the breakdown voltage (BV) of the device structure while maintaining transfer and output characteristics similar to those of C-ATMOS [25][26][27], the depth of the P-well on the right side is not changed.…”
Section: Introductionmentioning
confidence: 99%
“…Silicon carbide (SiC) power metal-oxide field-effect transistors (MOSFETs) have exhibited competitive performance due to their superior electrical and thermal properties, such as high voltage, high frequency, and high thermal conductivity. [1][2][3][4][5] For the reasons listed above, future accelerator facilities and space applications would also like to use the electrical benefits of SiC power MOSFETs. Nevertheless, SiC power MOSFETs are vulnerable to cosmic ray-induced high-energy heavy ions, resulting in catastrophic single-event burnout (SEB).…”
Section: Introductionmentioning
confidence: 99%