16.3: True‐Color 640 ppi OLED Arrays Patterned by CA i‐line Photolithography

Malinowski, Paweł E.; Ke, Tung Huei; Nakamura, Atsushi; Chang, Ting‐Yu; Gokhale, Pritesh; Steudel, Sören; Janssen, Dimitri; Kamochi, Yoshitaka; Koyama, Ichiro; Iwai, Yu; Heremans, Paul

doi:10.1002/sdtp.10332

Cited by 9 publications

(6 citation statements)

References 6 publications

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“…At this moment, we can show several building blocks necessary for industrial implementation of OLED patterning by photolithography ( Fig. 10): T75 lifetime above 200 hours for a small molecule, fluorescent blue stack [12]; integration with a flexible, IGZO-based active TFT backplane; electroluminescence of a red-green-blue side-by-side pixel array [10]; photoluminescence aperture ratio of 80% [13] and multicolor passive displays with a resolution of 1250 ppi (10 μm subpixel pitch).…”

Section: Discussionmentioning

confidence: 99%

“…While photolithography can be an answer, it still poses challenges related to compatibility of the photoresist chemistry [8]. Still, for the last few years, we have been improving methods of OLED patterning by photolithography with non-fluorinated, chemically amplified iline photoresists to address these roadblocks [9,10]. In this work, we summarize our OLED lithography status and demonstrate new proof-of-concept prototypes.…”

Section: Figure 1 Oled Photolithography Benefitsmentioning

confidence: 99%

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44‐1: Invited Paper: Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi

Malinowski

Nakamura

et al. 2017

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Section: Discussionmentioning

confidence: 99%

Section: Figure 1 Oled Photolithography Benefitsmentioning

confidence: 99%

44‐1: Invited Paper: Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi

Malinowski

Nakamura

et al. 2017

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“…We will show the optimization of the photoresist process and its corresponding resolution and aperture ratio in OLED devices. We demonstrated a 635 ppi R-G-B pixel and 1250 ppi multicolor demonstrators via photolithographic patterning processes [12], [13]. With the innovation in the process steps and environments, we see a clear improvement of OLED lifetime and performance after the photolithographic patterning process.…”

Section: Figure 1 Comparison Of Different Microdisplay Front Plane Technologiesmentioning

confidence: 95%

55.1: Invited Paper: FMM‐free OLED Manufacturing Enabled by Photolithographic Patterning Processes

Sandeheng

Alvarez

et al. 2021

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Resolution and brightness are the essential figure‐of‐merits for the microdisplay development needed for AR and VR applications. In this presentation, we show our technology development toward high‐resolution FMM‐free direct R‐G‐B OLED microdisplays. We show the schematic fabrication setup and integration route to fabricate red, green, and blue OLED pixels side‐by‐side by the OLED photolithographic patterning processes. We demonstrate a 1µm line and space feature with the photoresist and transfer the pattern to an OLED stack. With the high resolution of photoresist, high aperture ratio, and high‐resolution multicolor OLED pixel arrays are demonstrated. We also investigate the possible OLED degradations induced in the photolithography process. With the innovations in the process steps, OLED stacks, process environments, and photoresists, we demonstrate a breakthrough in the reliability of photolithography patterned OLED.

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“…This technical benefit motivated several research groups to apply it to OLED pixel patterning. They used a bi-layer resist approach [21][22][23] or photo-crosslinkable electroluminescent polymers as EML [24]. In case of a bi-layer resist approach, the choice of shielding layer and photoresist is important.…”

Section: Introductionmentioning

confidence: 99%

Two-Color Pixel Patterning for High-Resolution Organic Light-Emitting Displays Using Photolithography

et al. 2020

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Nowadays, the display industry is endeavoring to develop technology to provide large-area organic light-emitting diode (OLED) display panels with 8K or higher resolution. Although the selective deposition of organic molecules through shadow masks has proven to be the method of choice for mobile panels, it may not be so when independently defined high-resolution pixels are to be manufactured on a large substrate. This technical challenge motivated us to adopt the well-established photolithographic protocol to the OLED pixel patterning. In this study, we demonstrate the two-color OLED pixels integrated on a single substrate using a negative-tone highly fluorinated photoresist (PR) and fluorous solvents. Preliminary experiments were performed to examine the probable damaging effects of the developing and stripping processes upon a hole-transporting layer (HTL). No significant deterioration in the efficiency of the develop-processed device was observed. Efficiency of the device after lift-off was up to 72% relative to that of the reference device with no significant change in operating voltage. The procedure was repeated to successfully obtain two-color pixel arrays. Furthermore, the patterning of 15 μm green pixels was accomplished. It is expected that photolithography can provide a useful tool for the production of high-resolution large OLED displays in the near future.

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16.3: True‐Color 640 ppi OLED Arrays Patterned by CA i‐line Photolithography

Cited by 9 publications

References 6 publications

44‐1: Invited Paper: Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi

44‐1: Invited Paper: Photolithography as Enabler of AMOLED Displays Beyond 1000 ppi

55.1: Invited Paper: FMM‐free OLED Manufacturing Enabled by Photolithographic Patterning Processes

Two-Color Pixel Patterning for High-Resolution Organic Light-Emitting Displays Using Photolithography

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