2013
DOI: 10.1109/tcpmt.2012.2227260
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2.4-GHz Complementary Metal Oxide Semiconductor Power Amplifier Using High-Quality Factor Wafer-Level Bondwire Spiral Inductor

Abstract: A complementary metal oxide semiconductor (CMOS) power amplifier (PA) using a wafer-level bondwire spiral inductor with high-quality factor (Q) is presented. The inductor is made by three top metal traces connected with bondwire loops above the CMOS chip. The proposed inductor with 2.75-nH inductance achieves a Q of 18, which is three times as much as that of a conventional CMOS standard spiral inductor at 2.4 GHz. The Q of the inductor is over 15 from 2 to 14 GHz, which can cover the frequency band of wireles… Show more

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Cited by 15 publications
(15 citation statements)
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“…These dimensions of spiral inductors are listed in Table 2. The formula that is valid for planar spiral integrated inductors can be defined as [8]:…”
Section: Stand-alone Inductor Structurementioning
confidence: 99%
“…These dimensions of spiral inductors are listed in Table 2. The formula that is valid for planar spiral integrated inductors can be defined as [8]:…”
Section: Stand-alone Inductor Structurementioning
confidence: 99%
“…The wide metal track in the standard CMOS process must comply with the slot rules of the design rule check, reducing the quality factor (Q) of the inductors and increasing the power loss. In contrast, the bondwire can support a high drain current with high Q. Lin et al [26] proposed a PA that uses a wafer-level bondwire spiral inductor (BSL) with a high Q. Comparisons of Qbetween a conventional CMOS standard spiral inductor (SSL) and a wafer-level BSL revealed that, at the same inductance, the Q is 30 for a BSL, but 10 for an on-chip SSL.…”
Section: -Ghz Pa With Linearisermentioning
confidence: 99%
“…We propose a high-Q and wide tunable bondwire inductor (TBI) digitally controlled by RF CMOS switches. The bondwire inductors are adopted because their self-resistance and standard manufacturing process cost are much lower than those of spiral inductors [16,17]. The RF switches are designed using 180 nm silicon-on-insulator (SOI) CMOS technology to minimize their turn-on resistance.…”
Section: Introductionmentioning
confidence: 99%