2018
DOI: 10.1109/ted.2017.2773560
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2-D Analytical Drain Current Model of Double-Gate Heterojunction TFETs With a SiO2/HfO2 Stacked Gate-Oxide Structure

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Cited by 68 publications
(18 citation statements)
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“…Vishnoi et al [17] proposed the BTBT current model for DG-GAA-TFETs irrespective of the depletion regions at JSC and JDC by pseudo-2-D analytic modeling. The DMG in DG-TFETs exhibits better drive current and SS than SMG counterpart as reported by Kumar et al [18] and Jain et al [19]. Kumar et al [20] and Prabhat et al [21] reported the modeling of drive current and surface potential for DMG with SG/DG TFET structures respectively.…”
Section: Introductionmentioning
confidence: 84%
“…Vishnoi et al [17] proposed the BTBT current model for DG-GAA-TFETs irrespective of the depletion regions at JSC and JDC by pseudo-2-D analytic modeling. The DMG in DG-TFETs exhibits better drive current and SS than SMG counterpart as reported by Kumar et al [18] and Jain et al [19]. Kumar et al [20] and Prabhat et al [21] reported the modeling of drive current and surface potential for DMG with SG/DG TFET structures respectively.…”
Section: Introductionmentioning
confidence: 84%
“…Hence, the rate of total carriers generated due to tunneling gives the drain current. TLA is an accurate method to find drain current [8], [16]. Fig 3 shows the pictorial representation of TLA.…”
Section: Drain Current Modelmentioning
confidence: 99%
“…The characteristic analysis and structure optimization of the gate dielectric material [13][14][15] and gate dielectrics with different dielectric constants have been performed [15][16][17][18][19][20]. In device physics, the analytical modeling of TFETs with the double-gate structure [21][22][23][24][25][26][27] and surrounding-gate structure [28][29][30][31][32][33] has also been extensively performed. One disadvantage of silicon-based TFETs compared to MOS-FETs is the smaller forward current, and the magnitude of the forward current is determined by the efficiency of the tunneling current generation.…”
Section: Introductionmentioning
confidence: 99%