2016 IEEE 66th Electronic Components and Technology Conference (ECTC) 2016
DOI: 10.1109/ectc.2016.400
|View full text |Cite
|
Sign up to set email alerts
|

20" x 20" Panel Size Glass IPD Interposer Manufacturing

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2018
2018
2019
2019

Publication Types

Select...
4
1

Relationship

0
5

Authors

Journals

citations
Cited by 9 publications
(2 citation statements)
references
References 7 publications
0
2
0
Order By: Relevance
“…Glass as a substrate material has several merits, namely: high resistivity, a low dielectric loss at high frequency, adjustability in material properties especially coefficient of thermal expansion, and simple manufacturing process resulting from no need of an insulation layer. Additionally, a glass substrate can be processed in large panel sizes and has been recently proposed as a superior alternative to address the limitations of organic and silicon based interposers [1][2][3][4][5]. Based on these attributes, TGV interposer technology has emerged as a promising technology for 2.5D/3D RF integration.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Glass as a substrate material has several merits, namely: high resistivity, a low dielectric loss at high frequency, adjustability in material properties especially coefficient of thermal expansion, and simple manufacturing process resulting from no need of an insulation layer. Additionally, a glass substrate can be processed in large panel sizes and has been recently proposed as a superior alternative to address the limitations of organic and silicon based interposers [1][2][3][4][5]. Based on these attributes, TGV interposer technology has emerged as a promising technology for 2.5D/3D RF integration.…”
Section: Introductionmentioning
confidence: 99%
“…TGVs with 100 µm pitch and high aspect ratio are formed using a method called focused electrical discharging method in thick glass substrates, the method has achieved high throughput [14]. Studies have reported a pitch of 30 µm and a height of less than 200 µm for a TGV sample fabricated by laser drilling [1,[17][18][19][20]. A novel photosensitive glass, patterned by photolithography and followed by wet chemical etching process is reported, the TGVs with a diameter of 20 µm and a 4:1 aspect ratio is demonstrated [18].…”
Section: Introductionmentioning
confidence: 99%