2013 International Conference on Indium Phosphide and Related Materials (IPRM) 2013
DOI: 10.1109/iciprm.2013.6562647
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35 nm mHEMT Technology for THz and ultra low noise applications

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Cited by 63 publications
(22 citation statements)
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“…The chip set is realized in a GaAs-based 35 nm mHEMT technology and associated MMIC process [11]. The transistors achieve cutoff frequencies f T and f max of more than 500 GHz and 1000 GHz, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…The chip set is realized in a GaAs-based 35 nm mHEMT technology and associated MMIC process [11]. The transistors achieve cutoff frequencies f T and f max of more than 500 GHz and 1000 GHz, respectively.…”
Section: Introductionmentioning
confidence: 99%
“…The RF frontend proposed by [18], operates at 300 GHz and is able to transfer up to 64 Gbps using QPSK modulation on a distance of 1 m. The chipset is expected to operate at higher data rates or longer distances as well, but the setup is limited by practical constraints of employed instruments [18]. The design uses horn antennas with 24.2 dBi gain and the chip is realized in 35 nm GaAs mHEMT technology [19] with f T and f max of more than 500 and 1000 GHz, respectively [18], [19].…”
Section: A 300 Ghz Rf Frontendmentioning
confidence: 99%
“…The technology is based on a 50 nm or 35 nm gate-length InAlAs/InGaAs mHEMT [9]. A metamorphic buffer is used for a lattice-matched growth of the HEMT layers on 100 µm semi-insulating GaAs wafers.…”
Section: Iaf Fraunhofer Institute For Applied Solid State Physicsmentioning
confidence: 99%