Abstract:Vertically translating prestressed spring supported microelectromechanical shutters can be used as digital spatial light modulators for high speed, efficient transmissive display applications. Prestressed MEMS shutters have been fabricated alongside top gate a-Si:H TFTs using a four mask TFT-MEMS process and active matrix driving has been demonstrated.
“…Sub-millisecond response times are highly desirable as they would be indispensable for fieldsequential color systems. Previously, we reported a surprisingly strong asymmetry of the switching behavior of directly addressed MEMS devices 8 . Those experiments demonstrated a collapse response time in the range of 500 µs and release times in the range of tens of milliseconds.…”
Section: Switching Time Optimizationmentioning
confidence: 86%
“…Using the optimized five mask manufacturing process, an initial 1.45 cm diagonal active matrix demonstrator with 48x72 pixels, each containing one amorphous silicon addressing TFT (W/L=20µm/5µm) in the pixel area of 220µm x 130 µm, had previously been demonstrated 8 . Figure 7 shows a new 6 cm diagonal AM-MEMS display demonstrator having 320x240 pixels of 150µm x 150µm each.…”
Active matrix shutter type displays consisting of thin film transistors and pre‐stressed micro‐electro‐mechanical elements that were co‐fabricated in simple and robust four or five mask processes exhibit a unique combination of attractive features such as excellent optical characteristics, fast switching time and outstanding operating temperature range.
“…Sub-millisecond response times are highly desirable as they would be indispensable for fieldsequential color systems. Previously, we reported a surprisingly strong asymmetry of the switching behavior of directly addressed MEMS devices 8 . Those experiments demonstrated a collapse response time in the range of 500 µs and release times in the range of tens of milliseconds.…”
Section: Switching Time Optimizationmentioning
confidence: 86%
“…Using the optimized five mask manufacturing process, an initial 1.45 cm diagonal active matrix demonstrator with 48x72 pixels, each containing one amorphous silicon addressing TFT (W/L=20µm/5µm) in the pixel area of 220µm x 130 µm, had previously been demonstrated 8 . Figure 7 shows a new 6 cm diagonal AM-MEMS display demonstrator having 320x240 pixels of 150µm x 150µm each.…”
Active matrix shutter type displays consisting of thin film transistors and pre‐stressed micro‐electro‐mechanical elements that were co‐fabricated in simple and robust four or five mask processes exhibit a unique combination of attractive features such as excellent optical characteristics, fast switching time and outstanding operating temperature range.
“…So unlike active matrix liquid crystal displays where the bottom gate is used to protect the channel from the backlight, the MEMS shutter display requires top gate structures. Co-fabrication of prestressed MEMS elements with top gate a-Si:H TFTs had been presented before [5][6][7] by our group.…”
Section: Co-fabrication With A-si:h Tftsmentioning
confidence: 99%
“…Several optimizations had been performed before and the "P" structure had been proposed where the bending radius around 150 μm with actuation voltage around 35 V had been achieved. 6 Decreasing the bending radius without increasing the actuation voltage will not only increase the lightoutcoupling but also open the possibility to implement higher resolution (>250 ppi). For structures with lower bending radius ($60-70 μm), an "L"-shaped structure (Figure 5) is more advantageous because much light can be outcoupled through direct transmission.…”
Section: Optimization Of Mems Shuttermentioning
confidence: 99%
“…Though several attempts at commercialization had failed before, [2][3][4] our group has successfully demonstrated highly efficient and robust vertically translating MEMS shutter display for transmissive display application. [5][6][7] The vertically translated MEMS shutter display technology has been further improved by integrating metaloxide thin-film transistors (TFTs) and optimizing the structure for a high-resolution and highly efficient display.…”
Active matrix prestressed microelectromechanical shutter displays enable outstanding optical properties as well as robust operating performance. The microelectromechanical systems (MEMS) shutter elements have been optimized for higher light outcoupling efficiency with lower operation voltage and higher pixel density. The MEMS elements have been co‐fabricated with self‐aligned metal‐oxide thin‐film transistors (TFTs). Several optimizations were required to integrate MEMS process without hampering the performance of both elements. The optimized display process requires only seven photolithographic masks with ensuring proper compatibility between MEMS shutter and metal‐oxide TFT process.
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