3D optimization of a polymer MOEMS for active focusing of VCSEL beam

Abada, Sami; Camps, Thierry; Reig, Benjamin; Doucet, Jean‐Baptiste; Daran, Emmanuelle; Bardinal, Véronique

doi:10.1117/12.2052482

Cited by 4 publications

(4 citation statements)

References 2 publications

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“…As seen in figure 10(b), a maximal vertical displacement of ~8 µm was obtained for an actuation power of only 12 mW in both cases. These performances are in good agreement with the theoretical behaviour expected for this optimized design [27]. Moreover, the standard deviation of the measured displacement to its average value was equal or less than 0.5 µm, demonstrating the good reproducibility achievable using dry resist films for MOEMS fabrication process.…”

Section: Moems Characterizationsupporting

confidence: 86%

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Comparative study of soft thermal printing and lamination of dry thick photoresist films for the uniform fabrication of polymer MOEMS on small-sized samples

Abada

Salvi

Courson

et al. 2017

J. Micromech. Microeng.

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The aim was the uniform fabrication of high aspect ratio polymer-based MOEMS (microoptical-electrical-mechanical system) on small and/or fragile samples, such as GaAs. The printing conditions were optimized, and the resulting thickness uniformity profiles were compared to those obtained via lamination and SU-8 standard spin-coating. Under the best conditions tested, STP and lamination produced similar results, with a maximum deviation to the central thickness of 3% along the sample surface, compared to greater than 40% for SU-8 spin-coating. Both methods were successfully applied to the collective fabrication of DF1050-based MOEMS designed for the dynamic focusing of VCSELs (vertical-cavity surface-emitting lasers). Similar, efficient electro-thermo-mechanical behaviour was obtained in both cases.

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Section: Moems Characterizationsupporting

confidence: 86%

“…First, a titanium layer was deposited to serve as an actuation electrode material (50 nm). Second, a thicker gold layer (300 nm) was deposited to localize the power dissipation within the suspended areas [27]. These two metallization steps were achieved before DF-1050 development.…”

Section: Development Of a New Moems Fabrication Processmentioning

confidence: 99%

Comparative study of soft thermal printing and lamination of dry thick photoresist films for the uniform fabrication of polymer MOEMS on small-sized samples

Abada

Salvi

Courson

et al. 2017

J. Micromech. Microeng.

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show abstract

“…11 to illustrate the good agreement with the experimental data for both cases. Further details on this study can be found elsewhere [54]. Additional studies on MEMS cycling and reliability are now underway to estimate thermal actuation hysteresis observed for effective power greater than 30 mW corresponding to an actuation temperature of 150°C.…”

Section: A Moems Mechanical Behaviormentioning

confidence: 97%

Advances in Polymer-Based Optical MEMS Fabrication for VCSEL Beam Shaping

Bardinal

Camps

Reig

et al. 2015

IEEE J. Select. Topics Quantum Electron.

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In this paper, we discuss the design, fabrication, and characterization of electrothermally actuated polymer-based microoptical electromechanical microsystems (MOEMS) for active microoptics in vertical cavity surface emitting laser (VCSEL) devices. We describe in particular the principle of a SU8-based MOEMS designed for single-mode VCSEL beam active focusing. The ultimate objective is the realization of parallel compact optical scanners for sensing applications using collective and low-cost technologies. After discussing the advantages of the epoxy resist SU-8 for fabricating an integrated movable lens on active optical devices, we present our latest advances in technology for ensuring precise MOEMS fabrication on small III-V samples and for achieving accurate alignment of lenses on suspended circular membranes. Finally, we present our first results on the beam focusing of multimode VCSELs, which demonstrate the feasibility of our approach and could provide new insights in the MEMS-VCSEL field.

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“…6) However, the thickness homogeneity is still an issue to be solved. [7][8][9] Furthermore, coating μm thick SU-8 on a flexible film is difficult with the conventional techniques by utilizing the liquid resist. 10) To address this problem, a dry film resist (DFR), commonly utilized in printed circuit boards (PCBs), has been proposed to substitute the SU-8 liquid resist.…”

Section: Introductionmentioning

confidence: 99%

Utilizing a photosensitive dry film resist in proton beam writing

SEKI¹,

Kawamura²,

Hayashi³

et al. 2022

Jpn. J. Appl. Phys.

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Dry film resists (DFRs) are suitable for the fabrication of large volume devices as the thickness of the film can be easily controlled. Here, the DFR microstructures were manufactured using the proton beam writing (PBW) technique by taking advantage of direct writing, beam directivity, and processing depth. The results show that the required irradiation dose of 15 μm DFR was 10 nC/mm2 for 1 MeV protons. In summary, we have optimized the PBW conditions to create smooth surface micropatterns with a vertical wall in the DFR.

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3D optimization of a polymer MOEMS for active focusing of VCSEL beam

Cited by 4 publications

References 2 publications

Comparative study of soft thermal printing and lamination of dry thick photoresist films for the uniform fabrication of polymer MOEMS on small-sized samples

Comparative study of soft thermal printing and lamination of dry thick photoresist films for the uniform fabrication of polymer MOEMS on small-sized samples

Advances in Polymer-Based Optical MEMS Fabrication for VCSEL Beam Shaping

Utilizing a photosensitive dry film resist in proton beam writing

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