3D properties of pulsed corona streamers

Veldhuizen, E.M. van; Nijdam, S Sander; Luque, Alejandro; Brau, Fabian; Ebert, Ute

doi:10.1051/epjap/2009080

Cited by 3 publications

(3 citation statements)

References 22 publications

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“…However, plasma parameters during the discharge are spatially and temporally non-uniform (Veldhuizen et al, 2009). In order to find out the influence of this non-uniformity of the plasma parameters on the reliability of measurements obtained using our spectrometer, we have simulated the total emission spectrum of two plasma regions of equal volume observed simultaneously by our spectrometer.…”

Section: Electron Densitymentioning

confidence: 99%

Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

Pothiraja¹,

Bibinov²,

Awakowicz³

2012

Chemical Kinetics

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Section: Electron Densitymentioning

confidence: 99%

Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

Pothiraja¹,

Bibinov²,

Awakowicz³

2012

Chemical Kinetics

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“…[35][36][37][38] In addition to ozone, several oxides are generated: NO, N 2 O, NO 2 , NO 3 , and N 2 O 5 , which can be detected by emission spectroscopy or by dynamic mass spectrometry. 39,40 The main reactions involving charged, neutral, and excited atoms and molecules in the discharge region are summarized: 41 • Formation of negative ions occurs when low energy electrons collide with atoms or molecules. Cations are formed through the reactions with noble gases and nitrogen compounds, while oxygen-based gases often form negative ions.…”

Section: Role Of Energetic Species In Atmospheric-pressure Plasmmentioning

confidence: 99%

Status and potential of atmospheric plasma processing of materials

Pappas

2011

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

156

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This paper is a review of the current status and potential of atmospheric plasma technology for materials processing. The main focus is the recent developments in the area of dielectric barrier discharges with emphasis in the functionalization of polymers, deposition of organic and inorganic coatings, and plasma processing of biomaterials. A brief overview of both the equipment being used and the physicochemical reactions occurring in the gas phase is also presented. Atmospheric plasma technology offers major industrial, economic, and environmental advantages over other conventional processing methods. At the same time there is also tremendous potential for future research and applications involving both the industrial and academic world.

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“…All the measurements with our emission spectrometer are space and time averaged. However, the plasma parameters during the discharge are spatially and temporally non-uniform [41]. In order to find out the influence of this non-uniformity of the plasma parameters on the reliability of measurements obtained using our spectrometer, we have simulated the total emission spectrum of two plasma regions of equal volume observed by our spectrometer simultaneously.…”

Section: Determination Of Electron Densitymentioning

confidence: 99%

Pulsed corona plasma source characterization for film deposition on the inner surface of tubes

Pothiraja¹,

Bibinov²,

Awakowicz³

2010

J. Phys. D: Appl. Phys.

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To cite this version:Ramasamy Pothiraja, Nikita Bibinov, Peter Awakowicz. Pulsed corona plasma source characterization for film deposition on the inner surface of tubes. Journal of Physics D: Applied Physics, IOP Publishing, 2010, 43 (49) Abstract. A microplasma jet has been constructed for chemical vapor deposition on inner surface of narrow long tubes and is tested on a quartz tube with the inner diameter of 6 mm and the outer diameter of 8 mm. A long plasma filament (> 100 mm) is generated inside the tube in argon with methane admixture. Depending on the quantity of admixture in argon, the negative as well as the positive corona discharges are ignited. Both modes of plasma are characterized using optical emission spectroscopy. For this purpose, nitrogen is admixed with argon and its emission is used for the determination of gas temperature, electron velocity distribution function, and electron density at various places along the axis of the tube. The formation of active species, like C, C 2 , CH, etc. during the dissociation of methane, is observed through their characteristic emission. The rate of methane dissociation is determined at various places along the axis of the tube during both modes of discharge. Since the chemical kinetics of film growth process is different, different kinds of films are obtained during different modes of discharge.

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3D properties of pulsed corona streamers

Cited by 3 publications

References 22 publications

Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

Plasma-Chemical Kinetics of Film Deposition in Argon-Methane and Argon-Acetylene Mixtures Under Atmospheric Pressure Conditions

Status and potential of atmospheric plasma processing of materials

Pulsed corona plasma source characterization for film deposition on the inner surface of tubes

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