Abstract.A square 3D-trench electrode detector structure based on the fast readout electronics is simulated in this paper using TCAD tools. Due to the small size of this structure, the detector is intrinsically rad-hard and it's response time can be as fast as 10's of ps. Electric characteristics including electric potential and electric field have been simulated. From those characteristics, we focus on studying the improvement of the detector compared to all column electrode ultra-fast 3D silicon detector in electric potential and electric field distributions, etc. For example, the ''slow region" in the center of all column electrode detector will not appear in our new detector structure. Furthermore, we take the breakdown consideration of the 3D-trench electrode detector on this paper.
IntroductionWith the relatively fast readout electronics was available in real use [1], the silicon radiation detector with particularly fast velocity and response time had been introduced. For instance, fast silicon detectors have been used in the pioneering UA2 experiment at CERN, with the width of the shaped signal is 2 μs at half amplitude and 4 μs at the base [2]. The detector array used at colliders which have short inter-collision times will require a further increase in speed. A current amplifier with a rise-time of 4 ns and a pulse width at the base of 30 ns was developed to read out fast planar detectors [3]. A silicon detector system allowing higher speeds in timing using were developed. Silicon detectors with 3D n+ and p+ doped column electrodes that penetrate through the silicon bulk [4-5] have been developed, in which charge from long tracks to be collected in a rapid, smooth high current burst, as shown in Figure 1. Also, fabrication technology of making 3D silicon detectors with increased speed, sub-nanosecond time resolution fast current amplifiers, and constant-fraction comparators or fast wave-form recorders have been studied [6]. Developments in integrated circuit technology fabrication permit the design and fabrication of even higher speed current amplifiers [7][8]. Column electrodes are usually formed by etching holes with a diameter in the order of 10 m and diffusing dopant gasses into the surrounding single-crystal silicon.