2010
DOI: 10.1049/el.2010.1405
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40 Gbit/s error-free operation of oxide-confined 850 nm VCSEL

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Cited by 104 publications
(53 citation statements)
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“…(2) and Eq. (1). The difference between the exact and approximate BER is very small in the low-BER region and becomes apparent only for very high BER.…”
Section: Theoretical Ber and Sensitivity For Our Experimental Systemmentioning
confidence: 94%
See 1 more Smart Citation
“…(2) and Eq. (1). The difference between the exact and approximate BER is very small in the low-BER region and becomes apparent only for very high BER.…”
Section: Theoretical Ber and Sensitivity For Our Experimental Systemmentioning
confidence: 94%
“…Currently, 10 Gbps links are commercialized, and lasers and photoreceivers (although with limiting amplifiers only) for 25 Gbps at the wavelength of 850 nm are becoming available. However, with increased bit-rates and the recent development of VCSELs capable of operating at 40 Gbps at the wavelength of 850 nm [1] and 44 Gbps at the wavelength of 980 nm [2], it turns out that the transmission distance in MMF at such high bit-rates is limited by the modal dispersion, if on-off keying (OOK) modulation is used. Multilevel modulation, with higher spectral efficiency, is a potential way to extend the reach of MMF-based links at high bit-rates.…”
Section: Introductionmentioning
confidence: 99%
“…Recent years have seen an impressive increase in the speed of 850 nm GaAs-based VCSELs, reaching small signal modulation bandwidths exceeding 23 GHz and enabling error-free transmission at 40 Gbit/s back-to-back [2]. These devices show great promise as transmitters in future short-reach (rack-to-rack and boardto-board, 300 m) and very-short-reach (module-to-module and chipto-chip, 1 m) optical interconnects.…”
mentioning
confidence: 99%
“…High-speed design: The VCSEL structure is the same as in [2,4] with the addition of a regrown 59 nm-thick p-doped GaAs layer. The active region contains five strained InGaAs/AlGaAs quantum wells for high differential gain and a separate confinement heterostructure designed for fast carrier capture and low gain compression.…”
mentioning
confidence: 99%
“…These characteristics are due to the efficient optical mode and current confinement completed by the oxidation of AlAs or AlGaAs with abundant Al components [3] . The thermal selective wet oxidation confinement technique is widely used to fabricate infrared VCSELs such as 850 and 980 nm VCSELs [4,5] . Various papers have reported the control of thermal wet oxidation processing conditions [6,7] .…”
mentioning
confidence: 99%