Epitaxial SrTiO 3 films are deposited by on-axis magnetron sputtering on CeO 2 -buffered r-cut sapphire. The ferroelectric films possess low losses ͑e.g., tan ␦Ϸ0.001-0.004 at 300 K͒ and a large tunability at small electric fields. Different complex designs for ferroelectric capacities are prepared via dry etching ranging from standard designs to those in which the ferroelectric material is restricted to the gap of the capacity. The resulting capacity data can be explained in terms of an analytic model for parallel capacities. Due to modifications and optimization of the design, the quality factors for an improved capacity design exceeds the requirement for most applications K Ͼ45 already for extremely small voltages UϷ18 V, which demonstrates the good properties of the design in combination with the quality of our ferroelectric films. © 2002 American Institute of Physics. ͓DOI: 10.1063/1.1459486͔The rapid development of microwave applications in, among others, communication technology has triggered a strong demand for frequency tunable resonators and filters operating in the GHz regime. Thin films of ferroelectrics such as BaTiO 3 , SrTiO 3 ͑STO͒ and several others provide high dielectric constants ⑀ and the possibility of tuning since their ⑀ depends on the electric field strength, ⑀ϭ⑀(E). For tunable electronic devices and circuits, such films are, therefore, used as dielectric material in capacitors ͑see Fig. 1͒. Especially, the combination with conductors of extremely low rf losses like high-T C superconductors ͑HTS͒ seems to be promising. However, up to the present, the disadvantage of ferroelectric films is given by ͑i͒ the relatively high dielectric loss, for instance represented by typical values of the loss tangent of tan ␦Ͼ0.01 for STO films, ͑ii͒ the large voltages Uу100 V necessary for the frequency tuning, and ͑iii͒ the degradation of either the ferroelectric or HTS film in hybrid structures. This calls for a careful production control and an intelligent design of the capacitors. In this work, we demonstrate that low losses can be obtained in STO films, that small bias voltages of UϽ20 V can lead to a considerable tuning of nϷ1.6, and that degradation problems in the ceramic components might be avoided by a special design of the capacity.250 to 500 nm thick STO films are grown on CeO 2 -buffered r-cut sapphire (Al 2 O 3 ). Sapphire possesses extremely low microwave losses (tan ␦Ϸ10 Ϫ7 -10 Ϫ8 ), whereas the CeO 2 -buffer layer ͑30 nm thickness͒ reduces the lattice mismatch between STO and substrate. Furthermore, this substrate system has proven to be ideal for the deposition of high-temperature superconducting films, 1 i.e., the combination of STO with YBa 2 Cu 3 O 7 for the tunable high-Q resonators is feasible for this system. The layers are deposited via on-axis magnetron rf sputtering technique. CeO 2 growths ͑200͒ oriented with a full width at half maximum of ⌬ Ϸ0.8°-1.3°. The structural orientation of STO depends strongly on gas pressure and substrate temperature during deposition. At low proc...