2010
DOI: 10.1889/1.3500561
|View full text |Cite
|
Sign up to set email alerts
|

46.1: New Concept for Large Area White OLED Production for Lighting

Abstract: A new concept of a vertical in-line deposition machine for large area white OLED production has been developed. The machine concept and linear evaporation source designed for up to Gen 4 substrates resulted in material utilization of > 50 %. A vacuum handling and alignment system for shadow masks has been developed.

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
4
0

Year Published

2011
2011
2017
2017

Publication Types

Select...
3

Relationship

1
2

Authors

Journals

citations
Cited by 3 publications
(4 citation statements)
references
References 5 publications
0
4
0
Order By: Relevance
“…It is anticipated that the cost of OLED light lighting will continue to decrease as demand increases and manufacturing technology continues to improve. 4,38,39 …”
Section: Device Lifetimementioning
confidence: 99%
“…It is anticipated that the cost of OLED light lighting will continue to decrease as demand increases and manufacturing technology continues to improve. 4,38,39 …”
Section: Device Lifetimementioning
confidence: 99%
“…This stack structure was proposed by Merck in collaboration with IPMS and utilizes Merck's own high performance OLED materials. These materials were then evaporated using Gen4 linear evaporation sources [5]. The evaporation test procedure for each material included measurement of the dynamic rate as a function of temperature, validation of the stability and accuracy of the automatic rate control, layer thickness uniformity at production thicknesses and deposition rates, measurement of both the powder and film density, determination of the material utilization efficiency and chemical analysis of the coated material and residual material in the crucible with HPLC and NMR respectively.…”
Section: / H Landgrafmentioning
confidence: 99%
“…For this reason, a source of linear type has been developed that offers significant advantages over the conventional point source deposition approach . The source is located in a position remote from the substrate and the process is operated by scanning the source under the substrate.…”
Section: Introductionmentioning
confidence: 99%
“…For this reason, a source of linear type has been developed that offers significant advantages over the conventional point source deposition approach. 5,6 The source is located in a position remote from the substrate and the process is operated by scanning the source under the substrate. To secure stable film thickness uniformity on the substrate area when the source of linear type is used, the geometry of the source and the substrate must be arranged properly.…”
Section: Introductionmentioning
confidence: 99%