1993
DOI: 10.1016/0927-0248(93)90056-9
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7% stable efficiency large area a-Si: H solar modules by module design improvement

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Cited by 15 publications
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“…There are two main surface-textured ZnO film deposition methods. Neither low-pressure chemical vapor deposition (LPCVD) nor a postdeposition etching process after magnetron sputtering is ideal for forming quality-stable ZnO films because of difficult process control. The high deposition temperature of 200−500 °C for magnetron-sputtered ZnO films is also deleterious to the device performance ,, .…”
Section: Introductionmentioning
confidence: 99%
“…There are two main surface-textured ZnO film deposition methods. Neither low-pressure chemical vapor deposition (LPCVD) nor a postdeposition etching process after magnetron sputtering is ideal for forming quality-stable ZnO films because of difficult process control. The high deposition temperature of 200−500 °C for magnetron-sputtered ZnO films is also deleterious to the device performance ,, .…”
Section: Introductionmentioning
confidence: 99%
“…The first part was for forming the seriesconnected structure by using the standard laser processes known as the P1 (ablation of the front electrode), P2 (ablation of the silicon film), and P3 (ablation of the back electrode and silicon film) scribing processes. [16][17][18][19] These scribes were carried out by backscribing [20] (through the glass side) irradiations with a 1064 nm laser for P1 and a 532 nm laser for P2 and P3 scribes.…”
Section: Introductionmentioning
confidence: 99%