2003
DOI: 10.1023/a:1023640100556
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Cited by 17 publications
(1 citation statement)
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“…Methanol solvent has been previously reported to act as a reducing or oxidizing agent due to its thermal breakdown mechanism forming carbon dioxide and hydrogen, an explanation for this variation from ethanol deposits despite the similar solvent properties. 228 Carmalt et al used hexane or DCM in an in situ AACVD reaction for NbS 2 and TaS 2 films, which showed significantly different sized cluster morphologies depending on the solvent, however, the larger, and less uniform, clusters were grown using hexane for TaS 2 but DCM for NbS 2 . 229…”
Section: Precursor Design and Growth Criteria For Semiconductor Mater...mentioning
confidence: 99%
“…Methanol solvent has been previously reported to act as a reducing or oxidizing agent due to its thermal breakdown mechanism forming carbon dioxide and hydrogen, an explanation for this variation from ethanol deposits despite the similar solvent properties. 228 Carmalt et al used hexane or DCM in an in situ AACVD reaction for NbS 2 and TaS 2 films, which showed significantly different sized cluster morphologies depending on the solvent, however, the larger, and less uniform, clusters were grown using hexane for TaS 2 but DCM for NbS 2 . 229…”
Section: Precursor Design and Growth Criteria For Semiconductor Mater...mentioning
confidence: 99%