2012
DOI: 10.1109/jssc.2011.2164731
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A 1.2 V 12.8 GB/s 2 Gb Mobile Wide-I/O DRAM With 4 $\times$ 128 I/Os Using TSV Based Stacking

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Cited by 152 publications
(65 citation statements)
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“…The CPU die and WideIO2 DRAM dies are connected by through-silicon vias (TSVs) [5], which have much lower RC-delay than the conventional off-package DRAM channels. However, this is only a half solution as more DRAM dies do not translate to higher DRAM bandwidth due to TSVs shared by all DRAM dies.…”
Section: Introductionmentioning
confidence: 99%
“…The CPU die and WideIO2 DRAM dies are connected by through-silicon vias (TSVs) [5], which have much lower RC-delay than the conventional off-package DRAM channels. However, this is only a half solution as more DRAM dies do not translate to higher DRAM bandwidth due to TSVs shared by all DRAM dies.…”
Section: Introductionmentioning
confidence: 99%
“…The floorplan of the DRAM dies is generated by referring to the die photos from [8]. The core and L2 cache areas for 22 nm technology nodes are obtained from McPAT [9].…”
Section: Baseline Systemmentioning
confidence: 99%
“…In [32]- [34], the authors have demonstrated that implementing memory bus between a L2 cache and an on-chip main memory as wide as a cache line that operates at core's clock frequency can provide the maximum bandwidth that the L2 cache can consume and contribute to a larger gain in the system performance. In [35] and [36], 3-D stacked DRAM and SRAM caches with a vertical wide I/O interconnect have been fabricated at 50-nm and 0.18-μm technology nodes, respectively. In [37], a 3-D memory stacked system with 64 ARM Cortex-M3 cores has been fabricated at a 130-nm technology node.…”
Section: Related Workmentioning
confidence: 99%