2013 IEEE International Solid-State Circuits Conference Digest of Technical Papers 2013
DOI: 10.1109/isscc.2013.6487703
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A 130.7mm<sup>2</sup> 2-layer 32Gb ReRAM memory device in 24nm technology

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Cited by 51 publications
(13 citation statements)
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“…In late 2013, the first commercial MO-BF ReRAM product was announced, which will be a TaO x -based device integrated into an eight-bit microcontroller [7]. In early 2013, a bi-layer 32 Gb prototype chip was announced, which is nearing the capacity of modern NAND flash [9]. Device structure and material details were not given in this report.…”
Section: Metal Oxide: Bipolar Filamentarymentioning
confidence: 99%
“…In late 2013, the first commercial MO-BF ReRAM product was announced, which will be a TaO x -based device integrated into an eight-bit microcontroller [7]. In early 2013, a bi-layer 32 Gb prototype chip was announced, which is nearing the capacity of modern NAND flash [9]. Device structure and material details were not given in this report.…”
Section: Metal Oxide: Bipolar Filamentarymentioning
confidence: 99%
“…In 2012, Hynix demonstrated a TiO x /Ta 2 O 5 ReRAM based test chip which used the bilayer oxide to achieve nonlinearity [32]. In 2013, Sandisk/Toshiba reported a prototype 32 Gb ReRAM macro [33], although device details were not given.…”
Section: B Metal Oxide: Bipolar -Filamentarymentioning
confidence: 99%
“…[9] SanDisk and Toshiba have demonstrated the 32 GB RRAM chip in 24 nm technology. [10] For practical nonvolatile memory applications, RS devices should be developed in the crossbar array configuration to achieve the highest possible area efficiency and data storage density. However, the sneak current problem is a major concern in crossbar array configurations, owing to the parallel geometry of the memory architecture.…”
Section: Introductionmentioning
confidence: 99%