“…Therefore, the transistor parameters, such as channel length, the oxide thickness, the threshold voltage, and the drain breakdown voltage, have to be tuned to sustain operation and the usual device scaling cannot be adopted for them. In order to solve this problem, a multitransistor process has been introduced for 3.3-V operation Flash memories [1], [2], [4], [5]. While a transistor is optimized with a device scaling for of 3 the program and the erase.…”