2018 13th European Microwave Integrated Circuits Conference (EuMIC) 2018
DOI: 10.23919/eumic.2018.8539952
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A 3.9-4.7 GHz 0.35 mW DCO with −187.4 dBc FoM in 28nm CMOS

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Cited by 9 publications
(6 citation statements)
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“…The [10] is based on the schematic simulation, hence the FOM jitter is better than the proposed designs. The DCO in [11] is designed using 28 nm technology and it uses LC-tank based architecture. Hence, the phase noise performance of [11] is better than the DAC-based and controller-based DCO.…”
Section: Layout and Simulation Resultsmentioning
confidence: 99%
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“…The [10] is based on the schematic simulation, hence the FOM jitter is better than the proposed designs. The DCO in [11] is designed using 28 nm technology and it uses LC-tank based architecture. Hence, the phase noise performance of [11] is better than the DAC-based and controller-based DCO.…”
Section: Layout and Simulation Resultsmentioning
confidence: 99%
“…The DCO in [11] is designed using 28 nm technology and it uses LC-tank based architecture. Hence, the phase noise performance of [11] is better than the DAC-based and controller-based DCO. However, its active area is much larger than the proposed DAC-based and controller-based DCO in spite of the DCO that was implemented in 28 nm.…”
Section: Layout and Simulation Resultsmentioning
confidence: 99%
“…Another research in DCO adds coarse, medium, and fine-tuned switched-capacitor (SC) arrays to the traditional inductorcapacitor oscillator to achieve high resolution. [11][12][13][14][15][16][17][18] Luong presented a 54.79-63. 16 GHz DCO using an exponentially scaling SC ladder.…”
Section: Introductionmentioning
confidence: 99%
“…[11][12][13][14][15][16][17][18] Luong presented a 54.79-63. 16 GHz DCO using an exponentially scaling SC ladder. The measured resolution is 300 kHz, and the phase noise is less than À90.7 dBc/Hz, 11 whereas the DCO is still sensitive to substrate noise.…”
Section: Introductionmentioning
confidence: 99%
“…Submikroninėse technologijose kai kurių pagamintų SVG plotas nėra pateiktas. Nanometrinėse technologijose pagamintų ĮVG plotas kinta nuo 0,02 mm 2(Zhang & Otto, 2017) (22 nm technologija) ir(Levinger et al, 2018) (28 nm technologija) iki 0,65 mm 2 (40 nm technologija).Lyginant ĮVG ir SVG maksimalius plotus matoma, kad ĮVG maksimalus plotas yra 1,06 mm 2 tuo tarpu SVG maksimalus plotas yra 0,65 mm 2 . Iš čia galima teigti, kad maksimalus SVG plotas yra 36,3 % mažesnis nei maksimalus ĮVG užimamas plotas.…”
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