2008
DOI: 10.1038/nphoton.2008.135
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A 342-nm ultraviolet AlGaN multiple-quantum-well laser diode

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Cited by 219 publications
(148 citation statements)
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“…The dislocation density of crack-free AlGaN was observed between 1.8-6.0 × 10 8 /cm 2 from cathodoluminescence (CL) dark spots [9]. From these results of low dislocation AlGaN grown on inclined GaN facet, the various UV-LDs between 336-360 nm with AlGaN/AlGaN or GaN/AlGaN MQWs were demonstrated [9][10][11][12][13].…”
Section: Introductionmentioning
confidence: 83%
“…The dislocation density of crack-free AlGaN was observed between 1.8-6.0 × 10 8 /cm 2 from cathodoluminescence (CL) dark spots [9]. From these results of low dislocation AlGaN grown on inclined GaN facet, the various UV-LDs between 336-360 nm with AlGaN/AlGaN or GaN/AlGaN MQWs were demonstrated [9][10][11][12][13].…”
Section: Introductionmentioning
confidence: 83%
“…89 These UV lasers are normally based on gallium nitride (GaN). Power levels of UV diodes laser are usually limited.…”
Section: Uv Phototherapy For Skin and Other Disordersmentioning
confidence: 99%
“…In particular, heterostructures based on Al x Ga 1−x N/GaN represent the building-blocks for a number of current (opto)electronic devices, including blue and white LEDs [3,4], laser diodes and lasers [5], high-power- [6,7] and highelectron-mobility-transistors (HEMTs) [8,9]. Beside the tunability of the bandgap from the 3.4 eV of GaN to the 6.2 eV in AlN at room temperature, there is between GaN and AlN a 2.5% lattice mismatch, allowing the pseudomorphic growth of Al x Ga 1−x N layers with a biaxial tensile strain on GaN.…”
Section: Introductionmentioning
confidence: 99%