2011 Proceedings of the ESSCIRC (ESSCIRC) 2011
DOI: 10.1109/esscirc.2011.6044896
|View full text |Cite
|
Sign up to set email alerts
|

A 73μW 400Mbps stress tolerant 1.8V-3.6V driver in 40nm CMOS

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2

Citation Types

0
2
0

Year Published

2013
2013
2019
2019

Publication Types

Select...
4
1

Relationship

1
4

Authors

Journals

citations
Cited by 6 publications
(2 citation statements)
references
References 8 publications
0
2
0
Order By: Relevance
“…The I ON degradation of MOSFET due to HCI and BTI effect is one of the most challenging reliability concerns for Input/Output (I/O) buffer designs in nano-scale CMOS process [6], [7]. The signal integrity [8] and transmission line related issues like overshoot and undershoot [9] accelerate the degradation due to HCI and BTI effect on I/O buffer especially on output driver because it is directly interfacing with the peripheral devices.…”
Section: Introductionmentioning
confidence: 99%
“…The I ON degradation of MOSFET due to HCI and BTI effect is one of the most challenging reliability concerns for Input/Output (I/O) buffer designs in nano-scale CMOS process [6], [7]. The signal integrity [8] and transmission line related issues like overshoot and undershoot [9] accelerate the degradation due to HCI and BTI effect on I/O buffer especially on output driver because it is directly interfacing with the peripheral devices.…”
Section: Introductionmentioning
confidence: 99%
“…Unfortunately, such transistors are technology dependent and not available in recently developed processes such as the 28nm TSMC technology. Another way of designing these high-voltage circuits compatible with scaled technologies is to use stacked low-voltage standard CMOS transistors [2]- [11].…”
Section: Introductionmentioning
confidence: 99%