A Brief Review of Electron Kinetics in Radio-Frequency Plasmas

Electron temperature has attracted great attention in plasma processing, as it dominates the production of chemical species and energetic ions that impact the processing. Despite having been studied for several decades, the mechanism behind the quenching of electron temperature with increasing discharge power has not been fully understood. In this work, we investigated the quenching of electron temperature in an inductively coupled plasma source using Langmuir probe diagnostics, and suggested a quenching mechanism based on the skin effect of electromagnetic waves within local- and non-local kinetic regimes. This finding provides insight into the quenching mechanism and has implications for controlling electron temperature, thereby enabling efficient plasma material processing.

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A Brief Review of Electron Kinetics in Radio-Frequency Plasmas

Abstract: Electron kinetics, which shows two distant discharge regimes (nonlocal and local), has attracted major interest in both plasmas physics and industrial applications. In this paper, the nonlocal and local electron kinetics in radio frequency plasmas are briefly reviewed.

Cited by 3 publications

References 22 publications

Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor

Etch Rate Uniformity Monitoring for Photoresist Etch Using Multi-channel Optical Emission Spectroscopy and Scanning Floating Harmonic Probe in an Inductively Coupled Plasma Reactor

Research Progress on the Treatments of Keloids

On the Quenching of Electron Temperature in Inductively Coupled Plasma

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