2008 IEEE/ACM International Conference on Computer-Aided Design 2008
DOI: 10.1109/iccad.2008.4681647
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A capacitance solver for incremental variation-aware extraction

Abstract: Abstract-Lithographic limitations and manufacturing uncertainties are resulting in fabricated shapes on wafer that are topologically equivalent, but geometrically different from the corresponding drawn shapes. While first-order sensitivity information can measure the change in pattern parasitics when the shape variations are small, there is still a need for a high-order algorithm that can extract parasitic variations incrementally in the presence of a large number of simultaneous shape variations. This paper p… Show more

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Cited by 29 publications
(10 citation statements)
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“…Different strategies have been proposed in the literature to address such challenge, such as parallelization, Krylov subspace recycling [12], [13], stochastic model order reduction [14], [15], [11], [16] and path recycling of floating random walk (PR-FRW) [3] (exclusively for capacitance and resistance extraction).…”
Section: Sampling-based Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Different strategies have been proposed in the literature to address such challenge, such as parallelization, Krylov subspace recycling [12], [13], stochastic model order reduction [14], [15], [11], [16] and path recycling of floating random walk (PR-FRW) [3] (exclusively for capacitance and resistance extraction).…”
Section: Sampling-based Methodsmentioning
confidence: 99%
“…Such methods are discretization-free and do not rely on assembling or solving any linear systems of equations [1], [2]. Such methods will not be addressed in this paper and the reader is referred to [3] for a stochastic version of the floating random walk algorithm which uses path recycling (PR-FRW) to accelerate any samplingbased (i.e. non-intrusive) stochastic capacitance solver.…”
Section: A Problem Setupmentioning
confidence: 99%
“…Novel extraction methodologies can efficiently generate such sensitivity information [5,26]. A nice feature of this representation is that this explicit parameter dependence allows to obtain a reduced, yet similar representation when a projection scheme is applied Some questions may be raised about the order neccessary for an accurate representation of the parametric model.…”
Section: Representation Of Parametric Systemsmentioning
confidence: 99%
“…With parallel computing techniques, they have been applied to the block-or chip-level extraction task in the sign-off verification of very large scale integration (VLSI) circuits. Recently, a general FRW algorithm [3] and a hierarchical FRW algorithm [4] were proposed to deal with arbitrary dielectric configuration and for a fabric-aware extraction problem, respectively. In 2013, an FRW algorithm [5] was proposed for the interconnect structure with multilayered dielectrics, where the cross-interface transition probability and weight value are precharacterized for a given process technology.…”
Section: Introductionmentioning
confidence: 99%