A Commercially Viable 193 nm Single Layer Resist Platform.

Abstract

We report on our recent investigations on the formulation and processing of 193 nm single layer photoresists based on alternating copolymers of cycloolefins with malefic anhydride. Resists formulated with cycloolefin copolymers are compatible with 0.262 N tetramethylammonium developers, have excellent adhesion, sensitivity, etch resistance and thermal flow properties. The effect of polymer structure and composition, dissolution inhibitor structure and loading as well as the effect of the photoacid generator on the resist dissolution properties was investigated. Based on the results high contrast formulations were evaluated on a GCA XLS (NA=0.53, 4X reduction optics) deep-UV stepper to exhibit 0.27 p m L/S pair resolution with excellent photosensitivity. Based on the dissolution properties and a spectroscopic examination of the resist, we have designed materials that show < 0.17 µm L/S pair resolution with 193 nm exposures on a ISI tool (NA=0.60, lox reduction optics). In this paper, the formulation methodology will be detailed and the most recent results upon both with 248 and 193 nm irradiation will be described.

(Cumarin‐4‐yl)methylester als hocheffiziente und ultraschnelle Phototrigger für Protonen und ihre Anwendung zur Oberflächenansäuerung von Membranen

“…Diese maskierten ("caged") Protonen ermöglichen die Steuerung der räumlichen und zeitlichen pH-Verteilung ohne diffusionsbedingte Verzögerungen. [1,2] Die meisten maskierten Protonen sind Nitrobenzylderivate wie 2-Nitrobenzaldehyde [3][4][5] sowie 2-Nitrobenzyl-und/oder 1-(2-Nitrophenyl)ethylacetate, [1] -phosphate, [6][7][8] -tosylate [9,10] und -sulfate. [7,11] Ihre Anwendung wird jedoch durch ihre geringe Effizienz bei Anregung im langwelligen UV/Vis-Bereich und die Entstehung reaktiver o-Nitrosocarbonyl-Photoprodukte begrenzt.…”

(Coumarin‐4‐yl)methyl Esters as Highly Efficient, Ultrafast Phototriggers for Protons and Their Application to Acidifying Membrane Surfaces

“…With these proton sources ("caged protons"), the spatial and temporal pH distribution can be controlled without diffusional mixing delays. [1,2] Most of the precursors are nitrobenzyl derivatives, namely 2-nitrobenzaldehydes, [3][4][5] as well as 2-nitrobenzyl and/or 1-(2-nitrophenyl)ethyl acetates, [1] phosphates, [6][7][8] tosylates, [9,10] and sulfates. [7,11] Their application is limited by the low efficiency of the activation in the long-wavelength UV/Vis range and the generation of reactive o-nitrosocarbonyl photoproducts.…”

Hydrophilic polymethacrylates containing cholic acid-ethylene glycol derivatives as pendant groups

“…They play an important physiological role in the absorption of fat and cholesterol either by passive diffusion or active transport processes 1,2) . Because of their hepatic origin, amphiphilic character, rigid structure and acid-base properties, bile acids have drawn much interest in research areas related to asymmetric synthesis 3) , molecular recognition 4) , drug delivery systems 5,6) , artificial receptors 7) , and photogenerators 8) . Various interesting polymers have been prepared from bile acids and its derivatives, including polymers with bile acids as side pendant groups [9][10][11] , in the main chain [11][12][13][14] and as end groups 15) .…”