2018
DOI: 10.1007/s10854-018-8895-5
|View full text |Cite
|
Sign up to set email alerts
|

A comparative device performance assesment of CVD grown MoS2 and WS2 monolayers

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

3
10
0

Year Published

2020
2020
2024
2024

Publication Types

Select...
7
1

Relationship

1
7

Authors

Journals

citations
Cited by 21 publications
(13 citation statements)
references
References 33 publications
3
10
0
Order By: Relevance
“…C g can be defined as Cg = εgtgwhere ε g is the dielectric constant and t g is the thickness of the gate oxide. [ 45 ] The calculated μ FE values are 7.02 and 18. 21 cm 2 V −1 s −1 for the negatively and positively biased devices, respectively, which are rather high carrier mobilities for our device architecture and measurement conditions.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…C g can be defined as Cg = εgtgwhere ε g is the dielectric constant and t g is the thickness of the gate oxide. [ 45 ] The calculated μ FE values are 7.02 and 18. 21 cm 2 V −1 s −1 for the negatively and positively biased devices, respectively, which are rather high carrier mobilities for our device architecture and measurement conditions.…”
Section: Resultsmentioning
confidence: 99%
“…21 cm 2 V −1 s −1 for the negatively and positively biased devices, respectively, which are rather high carrier mobilities for our device architecture and measurement conditions. [ 45 ] The fabricated devices provide a significantly high current ON/OFF ratio of ≈10 5 and very low SS values of 315 and 325 mV dec −1 under positive and negative biases, respectively. The characteristic curves ( I DS ‐ V DS ) of the MoS 2 ‐only and MoS 2 ‐CQWs based devices are given in Figures 2c and 2d, respectively, for the gate modulation voltage swept from V BG = −5.0 to 5.0 V with an interval of 0.5 V. To further examine effect of the sensitization layer (i.e., CQWs layer) on the output characteristics of the devices under dark condition, we swept V DS voltage from −3.0 to 3.0 V. Later, the maximum saturation currents ( I DSS ) were measured before and after of the CQWs layer deposition and the measured values are found very close to each other, indicating that the CQWs layer does not cause any observable modification without illumination.…”
Section: Resultsmentioning
confidence: 99%
“…The 2D materials grown on semiconductors or insulating substrates can be directly used in subsequent applications. Figure 60 is a schematic diagram of a CVD method for growing MoS 2 and WS 2 on the surface of SiO 2 /Si substrates [ 396 ]. Lee et al synthesized a 0.72 nm thick single layer of MoS 2 using MoO 3 and element S at 650 °C in a one-step bottom-up method [ 397 ].…”
Section: Two-dimensional Materialsmentioning
confidence: 99%
“…Within this scope, 2D materials have been the most promising candidates to fulfill these demands 10 . The emerging 2D layered materials are currently at the center of intensive research efforts owing to their superior physical properties such as high carrier mobility 11 , 12 , broadband optical response 13 , large Young’s modulus 14 , 15 and high thermal conductivity 16 . In addition, the broad optical spectral range covered by 2D materials make them very promising for photonic and optoelectronic applications 17 .…”
Section: Introductionmentioning
confidence: 99%