2002
DOI: 10.1021/jp014647x
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A Comparative Study of the Adsorption of Chloro- and Non-Chloro-Containing Organophosphorus Compounds on WO3

Abstract: The adsorption of dimethyl methylphosphonate (DMMP), trimethyl phosphate (TMP), and methyldichlorophosphate (MDCP) on monoclinic tungsten oxide (m-WO3) evacuated at various temperatures was investigated using infrared spectroscopy. DMMP is the most common molecule used for evaluating the performance of WO3 and other semiconducting metal oxide (SMO)-based sensors to phosphonate-based nerve agents. However, toxic nerve agents such as sarin differ from DMMP in that they contain a functional group (P−F in sarin) t… Show more

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Cited by 44 publications
(54 citation statements)
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“…As observed in the low-frequency spectral region, the frequency of P O stretching mode, which occurs at 1276 cm −1 in gaseous phase, shifted to 1231 and 1253 cm −1 upon adsorption within the first minute, 45 and 23 cm −1 lower than those of gaseous DMMP. According to previous reports [17][18][19], the two positions are the evidence of the formation of two types of bonding between P O and WO 3 surface sites: adsorption via hydrogen bonding (1231 cm −1 ) and with surface Brønsted sites (1253 cm −1 ). Although a third adsorption mode (Lewis acid site adsorption) existed, as reported before [18,19], no evidence was observed in the current experiment.…”
Section: Adsorption Of Dmmp On Flower-like Wo 3 Particlesmentioning
confidence: 70%
See 1 more Smart Citation
“…As observed in the low-frequency spectral region, the frequency of P O stretching mode, which occurs at 1276 cm −1 in gaseous phase, shifted to 1231 and 1253 cm −1 upon adsorption within the first minute, 45 and 23 cm −1 lower than those of gaseous DMMP. According to previous reports [17][18][19], the two positions are the evidence of the formation of two types of bonding between P O and WO 3 surface sites: adsorption via hydrogen bonding (1231 cm −1 ) and with surface Brønsted sites (1253 cm −1 ). Although a third adsorption mode (Lewis acid site adsorption) existed, as reported before [18,19], no evidence was observed in the current experiment.…”
Section: Adsorption Of Dmmp On Flower-like Wo 3 Particlesmentioning
confidence: 70%
“…According to previous reports [17][18][19], the two positions are the evidence of the formation of two types of bonding between P O and WO 3 surface sites: adsorption via hydrogen bonding (1231 cm −1 ) and with surface Brønsted sites (1253 cm −1 ). Although a third adsorption mode (Lewis acid site adsorption) existed, as reported before [18,19], no evidence was observed in the current experiment. It can be easily understood if we consider that the adsorption herein occurred at room temperature rather than at higher temperature as in the previous reports.…”
Section: Adsorption Of Dmmp On Flower-like Wo 3 Particlesmentioning
confidence: 70%
“…Several studies were carried out to understand the mechanism of the adsorption and decomposition processes on such oxides as alumina-supported cerium oxide and iron co-impregnated oxide [31], manganese oxide [32], monoclinic tungsten oxide (m-WO 3 ) [33], cerium oxide, Fe 2 O 3 , silica [34][35][36][37][38], and TiO 2 [39][40][41][42]. The thermal oxidative decomposition study of DMMP on amorphous manganese oxide and Al 2 O 3 -supported manganese oxide catalyst has shown the DMMP oxidation to CO 2 [32].…”
Section: Introductionmentioning
confidence: 99%
“…The thermal oxidative decomposition study of DMMP on amorphous manganese oxide and Al 2 O 3 -supported manganese oxide catalyst has shown the DMMP oxidation to CO 2 [32]. The investigation of the adsorption of DMMP on monoclinic tungsten oxide has proven that DMMP simulant adsorbs on the surface solely through the P=O functionality with the surface water layer as well as the Lewis and Brönsted acid site [33]. DMMP on the alumina-supported cerium oxide decomposes by producing methanol and dimethyl ether [34].…”
Section: Introductionmentioning
confidence: 99%
“…Our studies provided a better understanding of the mode of interaction between the simulant molecule, dimethyl methylphosphonate (DMMP), and the WO 3 surface sites using FTIR spectroscopy [39][40][41][42]. Therein, the DMMP adsorbed on the surface was shown to decompose and poison the surface via the methylphosphate group at temperatures above 300°C.…”
Section: Introductionmentioning
confidence: 96%