2019
DOI: 10.1016/j.spmi.2018.11.004
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A computational study of a carbon nanotube junctionless tunneling field-effect transistor (CNT-JLTFET) based on the charge plasma concept

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Cited by 29 publications
(7 citation statements)
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“…An interesting matter for further computational investigations is the synergy of MFMIS or MFIS-based configurations with some modern enhancement methods such as gate work-function engineering, 41 global optimization, 49 dielectric engineering, 16,50 and chemical and electrostatic doping engineering, 51,52 in order to improve some demerits such as mitigating the leakage current, suppressing the ambipolar behavior, and reducing the off-current. More importantly, emerging nanoscale FETs based on graphene sheet/nanoribbon [53][54][55][56][57][58][59] can also be endowed with MFMIS/MFIS configurations to boost their analog and switching performance while paving the way toward modern applications.…”
Section: Resultsmentioning
confidence: 99%
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“…An interesting matter for further computational investigations is the synergy of MFMIS or MFIS-based configurations with some modern enhancement methods such as gate work-function engineering, 41 global optimization, 49 dielectric engineering, 16,50 and chemical and electrostatic doping engineering, 51,52 in order to improve some demerits such as mitigating the leakage current, suppressing the ambipolar behavior, and reducing the off-current. More importantly, emerging nanoscale FETs based on graphene sheet/nanoribbon [53][54][55][56][57][58][59] can also be endowed with MFMIS/MFIS configurations to boost their analog and switching performance while paving the way toward modern applications.…”
Section: Resultsmentioning
confidence: 99%
“…13,14 For this reason, several improvement techniques have been proposed to mitigate the DSDT issue while boosting the performance of the ultrascaled CNT-TFET. Particularly, we cite some approaches, which have been reported to improve the CNT-TFET at ultrascaled regime, namely, the use of p-n doping profile, 15 dielectric engineering, 16 doping engineering, 17,18 heterostructure engineering, 19 ungated region, 20 dual-material gate design, 21 and strain engineering. 22 Therefore, more approaches and improvements techniques should be proposed to increasingly boost the performance of ultrascaled CNT-based TFETs.…”
mentioning
confidence: 99%
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“…However, biosensors based on conventional TFET need ultra-steep doping profile at the source and drain regions to generate abrupt junctions [17][18][19][20][21][22]., which tends to produce random dopant fluctuations (RDFs) in heavily doped active region and leads to high thermal budget in manufacturing process [23,24].what's more, low ON-state current is an inherent disadvantage in these TFETs, which is limited by quantum tunneling effects between source-channel interface. According to the generation mechanism of tunneling current, semiconductor with lower band gap is required in source region and material with high electron mobility is necessary between source and channel interface.…”
Section: Introductionmentioning
confidence: 99%
“…6,7 In order to improve the electrical properties of tunnel transistors, various methods have been used, including electrically doping or charge plasma, lightly doping, Schottky-Ohmic structure, multimaterial gate, and heterogeneous structures. [8][9][10][11][12][13] In most of previous studies, the main objective has been to reduce am-bipolar and leakage current and the ON-current is not significantly changed. The analog parameters of the above structures have also been less investigated.…”
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confidence: 99%