A Design-Oriented Approach to Implement Inverse Lithography Technology OPC in Silicon Photonics MPW Platform

Huang, Zengzhi; Huang, Wenli; Zhu, Jiguang; Cao, Guowei; Feng, Junbo; Zheng, Zhen-Guo; Jin, Yadong

doi:10.1109/iwaps54037.2021.9671061

Cited by 2 publications

(2 citation statements)

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“…The principle is that the OPE sacrifices the added pattern to obtain the desired pattern in the design. Image resolution can be improved using optical proximity effect correction [ 13 ]. By changing the image of the photomask, the pattern on the photoresist can be aligned with the design.…”

Section: Optical Proximity Effect Correction (Opc)mentioning

confidence: 99%

“…The dummy finger between the electrode and the bus bar creates an electrode gap. Although a narrow electrode gap (a narrow gap means that it is close to the light source wavelength of the lithograph or less than it) can help suppress the lateral leakage of SAW [ 2 , 9 , 10 ], it can also cause significant OPE during the lithography process [ 11 , 12 , 13 ]. Hence, for SAW resonators, OPE will cause edge rounding and inward shrinkage of the electrodes and dummy electrodes on both sides of the electrode gaps, which can reduce the effectiveness of transverse SAW leakage suppression.…”

Section: Introductionmentioning

confidence: 99%

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Improvement of YX42° Cut LiTaO3 SAW Filters with Optical Proximity Effect Correction Method

Luo

Zou

Yang³

et al. 2023

Micromachines

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Due to the influence of the optical proximity effect (OPE), it is easy for a pattern of photoresistance to be inconsistent with a design pattern, thus damaging the performance of a SAW resonator. To solve this problem, this paper proposes an optimization method for SAW filters based on optical proximity correction (OPC). This method can avoid the tip discharge problem of SAW filters by suppressing the problem of rounding and shrinking of dummy electrode and electrode tail caused by OPE. This method increases the quality factor (Q) of the SAW resonator and thus decreases the insertion loss of the SAW filter. The filter increases the bandwidth by 1.8 MHz at −1.5 dB after applying the OPC method. Additionally, it improves the stability of the filter under high power conditions.

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Section: Optical Proximity Effect Correction (Opc)mentioning

confidence: 99%