“…On the other hand, the charge accumulation, which is formed around the drain n-n + interface, is not found in the corresponding silicon device. As discussed in [9,17] for the GaAs n + -nÀn + diode, this enhanced electron density near the drain results from the backscattering of carriers into the active region after having already entered the high doping drain region. Due to this typical multi-valley effect, the anode contact cannot be simply treated as a drain for the electrons in the designing of submicron GaAs devices, since this region has a strong influence on the distribution of electrons in the active zone.…”