2019
DOI: 10.1002/adfm.201902494
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A Facile Method for the Growth of Organic Semiconductor Single Crystal Arrays on Polymer Dielectric toward Flexible Field‐Effect Transistors

Abstract: Polymer dielectrics with intrinsic mechanical flexibility are considered as a key component for flexible organic field-effect transistors (OFETs). However, it remains a challenge to fabricate highly aligned organic semiconductor single crystal (OSSC) arrays on the polymer dielectrics. Herein, for the first time, a facile and universal strategy, polar surface-confined crystallization (PSCC), is proposed to grow highly aligned OSSC arrays on poly(4-vinylphenol) (PVP) dielectric layer. The surface polarity of PVP… Show more

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Cited by 62 publications
(66 citation statements)
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“…The ribbon width monotonically decreases with increasing dip-coating speed. The average ribbon thickness was determined to be approximately of 14 and 65 nm for withdrawing speed of the substrate of U = 0.02 and 0.07 mm/s, respectively, which is consistent with the expected trend that the average film thickness is inversely facile, and effective polar surface-confined crystallization (PSCC) method to achieve highly aligned OSSCs on the polymer dielectric, [78]. In this method, patterned PVP surface with alternating polarity difference was used as a growth substrate to guide the aligned growth of OSSCs.…”
Section: Iii) Periodic Deposits and Patterned Deposition At Moving Contact Linessupporting
confidence: 79%
“…The ribbon width monotonically decreases with increasing dip-coating speed. The average ribbon thickness was determined to be approximately of 14 and 65 nm for withdrawing speed of the substrate of U = 0.02 and 0.07 mm/s, respectively, which is consistent with the expected trend that the average film thickness is inversely facile, and effective polar surface-confined crystallization (PSCC) method to achieve highly aligned OSSCs on the polymer dielectric, [78]. In this method, patterned PVP surface with alternating polarity difference was used as a growth substrate to guide the aligned growth of OSSCs.…”
Section: Iii) Periodic Deposits and Patterned Deposition At Moving Contact Linessupporting
confidence: 79%
“…The patterning of sacrificial coating is realized by printing or photolithography of a photoresist. [ 39,40 ] After plasma treatment, the regions without coating become more wettable. The sacrificial coating can be easily removed by washing with water or organic reagents (Figure 2d).…”
Section: Construction Methodologymentioning
confidence: 99%
“…The heterogeneous wettability substrate exhibits excellent capability in precise liquid manipulation, and it has attracted enormous research interest for various applications by rational design of the wettability heterogeneity on the surface. For example, high-quality organic semiconductor single crystal arrays are facilely patterned on heterogeneous wettability substrates for flexible field-effect transistors (FETs), [39] and nanoliter-scale sample droplets with concentration as low as femtoliter mole are detected through the coupling effect of enrichment and surface-enhanced Raman scattering (SERS) on Au-areole-deposited wettability-patterned substrates. [35] In this section, we summarize typical applications focused on optic/electronic device fabrication and biosensing/detection using heterogeneous wettability surfaces.…”
Section: Applicationsmentioning
confidence: 99%
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