A fast level set framework for large three-dimensional topography simulations

Ertl, Otmar; Selberherr, S.

doi:10.1016/j.cpc.2009.02.002

Cited by 43 publications

(29 citation statements)

References 17 publications

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“…In microelectronics the level set method has been mostly applied for topography simulations, like etching and deposition processes [94,95]. In this method the void surface, C, is implicitly represented by the level set of a given function,…”

Section: Level Set Methodsmentioning

confidence: 99%

Physically based models of electromigration: From Black’s equation to modern TCAD models

Orio

Ceric

Selberherr

2010

Microelectronics Reliability

120

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Section: Level Set Methodsmentioning

confidence: 99%

Physically based models of electromigration: From Black’s equation to modern TCAD models

Orio

Ceric

Selberherr

2010

Microelectronics Reliability

120

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“…We have recently developed [15] a fast LS framework which combines the sparse field method [16] and the hierarchical runlength encoded LS data structure [17] in order to reduce the computation time as well as the memory requirements. However, due to the parallel implementation of the Monte Carlo ray tracing algorithm, a parallelization of the LS framework was also necessary as described in [12] in order to avoid a critical bottleneck, when running the simulation on multi-core machines.…”

Section: B Level Set Methodsmentioning

confidence: 99%

Three-dimensional simulation of focused ion beam processing using the level set method

Ertl

Filipovic

Selberherr

2010

2010 International Conference on Simulation of Semiconductor Processes and Devices

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Abstract-Three-dimensional simulations of focused ion beam milling, which use the level set method for surface evolution, are presented for the first time. This approach allows the inherent description of topological changes. The surface rates are calculated using Monte Carlo ray tracing in order to incorporate shadowing as well as redeposition. Parallelization is used to reduce the computation time.

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“…Boolean operators prove to be very useful in different fields such as topography simulations (22), machining processes (23) and simulations involving multi-materials parts (24).…”

Section: Combining Level Setsmentioning

confidence: 99%

Semi-implicit representation of sharp features with level sets

Kalameh

Pierard

Friebel

et al. 2016

Finite Elements in Analysis and Design

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The present contribution enriches the nowadays "classical" level set implicit representation of geometries with topological information in order to correctly represent sharp features. For this, sharp features are classified according to their positions within elements of the level set support. Based on this additional information, sub-elements and interface-mesh used in a finite element context for integration and application of boundary conditions are modified to match exactly to the sharp features. In order to analyze evolving geometries, Boolean operations on these semi-implicit representations are derived so that the minimal additional information to represent correctly the new geometry is stored. This approach has been successfully applied to complex two-dimensional geometries. It computes in a robust way numerous Boolean operations and guarantees the precision and the convergence rate of the numerical simulations.

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A fast level set framework for large three-dimensional topography simulations

Cited by 43 publications

References 17 publications

Physically based models of electromigration: From Black’s equation to modern TCAD models

Physically based models of electromigration: From Black’s equation to modern TCAD models

Three-dimensional simulation of focused ion beam processing using the level set method

Semi-implicit representation of sharp features with level sets

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