2012
DOI: 10.1109/ted.2011.2175397
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A Ferroelectric and Charge Hybrid Nonvolatile Memory—Part II: Experimental Validation and Analysis

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Cited by 12 publications
(4 citation statements)
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“…Furthermore, though it is only a hypothesis and not proved here, 5 nm thick Al 2 O 3 layer is so thin that charges may tunnel from p-Si through Al 2 O 3 layer to P(VDF-TrFE)/Al 2 O 3 interface to partly compensate polarization charges. S. Rajwade et al have proposed and experimentally realized ferroelectric and charge hybrid nonvolatile memory devices in order to improve retention property of both logic states, 21,22 where charges can tunnel through 5.4 nm thick SiO 2 layer and then trap in 2.5 nm thick HfO 2 layer. If charge tunneling happens in P(VDF-TrFE)/Al 2 O 3 /p-Si capacitors, retention property is expected to be further improved.…”
Section: -8mentioning
confidence: 99%
“…Furthermore, though it is only a hypothesis and not proved here, 5 nm thick Al 2 O 3 layer is so thin that charges may tunnel from p-Si through Al 2 O 3 layer to P(VDF-TrFE)/Al 2 O 3 interface to partly compensate polarization charges. S. Rajwade et al have proposed and experimentally realized ferroelectric and charge hybrid nonvolatile memory devices in order to improve retention property of both logic states, 21,22 where charges can tunnel through 5.4 nm thick SiO 2 layer and then trap in 2.5 nm thick HfO 2 layer. If charge tunneling happens in P(VDF-TrFE)/Al 2 O 3 /p-Si capacitors, retention property is expected to be further improved.…”
Section: -8mentioning
confidence: 99%
“…In order to generate better performances of battery charging, many battery charging methods have been proposed. They are constant trickle current (CTC), constant current (CC), and CC and constant-voltage (CC-CV) hybrid charge methods [22]. Among these methods, the CTC charging method needs a larger charging time.…”
Section: Buck-boost Convertermentioning
confidence: 99%
“…1 Benefiting from its ferroelectricity (its remanent polarization is 6−8 μC/cm 2 and the coercive electric field is 45−55 MV/m), organic nonvolatile memory devices such as ferroelectric capacitors (FC), 2 ferroelectric field-effect transistors (FeFET), 3,4 ferroelectric diodes (FD), 5,6 and ferroelectric junctions (FJ), 7 have been heavily developed for the application of flexible electronics. 8−10 Among these devices, the interface between the ferroelectric layer and its adjacent layer (including electrode, semiconductor, and insulator) plays a key role in controlling ferroelectric polarization switching behavior, 11,12 tuning charge transport, 13−16 modulating charge injection, 17,18 and even affecting operation stability. 19 Hysteresis property in the electric characteristics of these devices is widely concerned, which is attributed to the hysteretic electric polarization induced by spontaneous ferroelectric dipole rotation in ferroelectrics.…”
Section: Introductionmentioning
confidence: 99%
“…To our knowledge, polyvinylidene fluoride and its copolymer, poly­(vinylidene fluoride-trifluoroethylene), denoted as P­(VDF-TrFE), has been widely investigated due to its ferroelectricity since 1969, which is analogous to ferromagnetism, exhibiting spontaneous electric polarization reoriented by an external electric field . Benefiting from its ferroelectricity (its remanent polarization is 6–8 μC/cm 2 and the coercive electric field is 45–55 MV/m), organic nonvolatile memory devices such as ferroelectric capacitors (FC), ferroelectric field-effect transistors (FeFET), , ferroelectric diodes (FD), , and ferroelectric junctions (FJ), have been heavily developed for the application of flexible electronics. Among these devices, the interface between the ferroelectric layer and its adjacent layer (including electrode, semiconductor, and insulator) plays a key role in controlling ferroelectric polarization switching behavior, , tuning charge transport, modulating charge injection, , and even affecting operation stability …”
Section: Introductionmentioning
confidence: 99%