A focused gas-ion beam system for submun application

Wilbertz, Ch.; Maisch, Th.; Huttner, Diana; Böhringer, K. F.; Jousten, Karl; Kalbitzer, S.

doi:10.1016/0168-583x(92)95180-y

Cited by 21 publications

(2 citation statements)

References 3 publications

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“…Inspired by their work Dr. Siegfried Kalbitzer at the Max Planck Institute (MPI) in Heidelberg, Germany gave several of his graduate students the assignment of making a GFIS “SuperTip” that could one day become the ion source for a GFIS scanning system. After 8 years of work, the MPI group perfected a fabrication recipe that provided high brightness (Wilbertz et al ., ). The recipe was reported to be reproducible, and able to produce a GFIS with stable emission current for a variety of gas species.…”

Section: The Gas Field Ionization Sourcementioning

confidence: 97%

The history and development of the helium ion microscope

Economou¹,

Notte²,

Thompson³

2011

Scanning

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The helium ion microscope has recently emerged as a commercially available instrument. However, its roots go back more than 60 years to the development of the field ion microscope in Berlin, first reported in 1951. Over the intervening years, numerous researchers have pursued the development of a gas field ionization source with the goal of producing a suitable source for an ion microscope. This proved to be an elusive goal until early in this century when a number of discoveries led to a successful source, and shortly thereafter, an instrument fully able to exploit its advantages. Many individuals and many technical advances have come together to make this new class of microscope. The long history of this quest is reviewed along with the recent advances that led to the achievement of this milestone. A brief summary of the current status of the technology and its applications are given.

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Section: The Gas Field Ionization Sourcementioning

confidence: 97%

The history and development of the helium ion microscope

Economou¹,

Notte²,

Thompson³

2011

Scanning

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“…Most commercial FIB systems are equipped with gallium liquid metal ion sources 2 . However, advances made over the past decade in technologies such as gas field ion 3 4 5 and inductively coupled plasma 6 7 sources (ICPS) have increased the use of light species (H, He, O and Ne) in the fabrication of nanostructures 8 9 10 . These species enable control over implantation, sputtering and chemical interactions with the target, but the damage generated by many of these ions is poorly understood at the high fluencies required for FIB milling 6 11 (relative to those used for implantation 12 13 ).…”

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confidence: 99%

Maskless milling of diamond by a focused oxygen ion beam

Martin

Randolph²,

Botman³

et al. 2015

Sci Rep

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Recent advances in focused ion beam technology have enabled high-resolution, maskless nanofabrication using light ions. Studies with light ions to date have, however, focused on milling of materials where sub-surface ion beam damage does not inhibit device performance. Here we report on maskless milling of single crystal diamond using a focused beam of oxygen ions. Material quality is assessed by Raman and luminescence analysis, and reveals that the damage layer generated by oxygen ions can be removed by non-intrusive post-processing methods such as localised electron beam induced chemical etching.

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Nanolithography

Harriott

Hull

2004

Introduction to Nanoscale Science and Technology

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A focused gas-ion beam system for submun application

Cited by 21 publications

References 3 publications

The history and development of the helium ion microscope

The history and development of the helium ion microscope

Maskless milling of diamond by a focused oxygen ion beam

Nanolithography

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