“…This is absolutely crucial in mitigating the polarization fields inherent to c-plane nitrides which would otherwise result in etching at only one interface of the sacrificial layer[76]. As a result, the InGaN SSL design proposed by Haberer et al with thin alternating layers of varying In content has become a commonly used sacrificial structure for the undercutting of microdisks by PEC etching[7,10,13,15,50,54,59]. However, the relaxation of pseudomorphic InGaN epilayers on GaN substrates is known to result in the generation of dislocations[77], which in the case of the InGaN SSL growth can result in a second source of dislocations, separate to those associated with the GaN pseudosubstrate.. El-Ella et al first demonstrated that the growth of the SSL can result in generation of dislocations by growing a series of structures containing SSLs of varying In content[75].…”