“…However, the proper estimation of the impurity profile still remains as a main problem especially for p-i-n optoelectronic devices. Several experimental techniques have been used for the display of the doping profile in a material, among these secondary ion mass spectroscopy (SIMS), spreading resistance profiling (SPR) [4][5][6], C-V [7][8][9] are widely used. In addition, data about electrically active defects are deduced from deep level transient (DLTS) [10] and admittance spectroscopy (AS) [11] techniques.…”