A High-Bandwidth MEMS Nanopositioner for On-Chip AFM: Design, Characterization, and Control

Maroufi, Mohammad; Bazaei, Ali; Moheimani, S. O. Reza

doi:10.1109/tcst.2014.2345098

Cited by 40 publications

(25 citation statements)

References 48 publications

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“…n-Si h100i wafers are oxidized, and lithography for tip formation is done. Reactive ion etching (RIE) with double resist, a SiO 2 mask, and Ar-SF 6 plasma are used to create mesa islands at places where the free end of the cantilever should be. Next, sharp tips are formed by RIE and/or wet etching based undercuts.…”

Section: Fabrication Of Active Cantilever Probesmentioning

confidence: 99%

“…2 Furthermore, optimization of scanner properties by using stiffer and compressed Z-piezo-stacks have contributed to bandwidth improvements of actuation in the vertical direction, which has resulted in significantly improved imaging speeds. [3][4][5][6] Another approach to establish high-speed AFM is based on reducing the size of the AFM cantilevers, a development that started in 1993. 7,8 As a result, short cantilevers (23 Â 12 lm) have been developed.…”

Section: Introductionmentioning

confidence: 99%

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Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Rangelow

Ivanov

Ahmad

et al. 2017

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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With the recent advances in the field of nanotechnology, measurement and manipulation requirements at the nanoscale have become more stringent than ever before. In atomic force microscopy, high-speed performance alone is not sufficient without considerations of other aspects of the measurement task, such as the feature aspect ratio, required range, or acceptable probe-sample interaction forces. In this paper, the authors discuss these requirements and the research directions that provide the highest potential in meeting them. The authors elaborate on the efforts toward the downsizing of self-sensed and self-actuated probes as well as on upscaling by active cantilever arrays. The authors present the fabrication process of active probes along with the tip customizations carried out targeting specific application fields. As promising application in scope of nanofabrication, field emission scanning probe lithography is introduced. The authors further discuss their control and design approach. Here, microactuators, e.g., multilayer microcantilevers, and macroactuators, e.g., flexure scanners, are combined in order to simultaneously meet both the range and speed requirements of a new generation of scanning probe microscopes.

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Section: Fabrication Of Active Cantilever Probesmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Rangelow

Ivanov

Ahmad

et al. 2017

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

View full text Add to dashboard Cite

show abstract

“…The first term of Equation (14) is the same as that of the static model which compensates for the geometric errors. In the following experimental studies, the adaptive models all refer to Equation (14). In addition, we can also use the following model:…”

Section: Adaptive Model Using Kilometer-zero (Kmz)mentioning

confidence: 99%

“…Nevertheless, they are usually designed for single purposes and extremely costly (in the millions of euros range). On the other hand, it is possible to control nanopositioning stages in open loop at the task level while keeping the inner loop based on internal nanopositioning stage sensors [14][15][16]. The open loop method can be realized with the calibration approach [17][18][19] where a good and reliable model is required to depict the whole system inclusive of all the influential parameters identified.…”

Section: Introductionmentioning

confidence: 99%

Calibration of Nanopositioning Stages

2015

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Accuracy is one of the most important criteria for the performance evaluation of microand nanorobots or systems. Nanopositioning stages are used to achieve the high positioning resolution and accuracy for a wide and growing scope of applications. However, their positioning accuracy and repeatability are not well known and difficult to guarantee, which induces many drawbacks for many applications. For example, in the mechanical characterisation of biological samples, it is difficult to perform several cycles in a repeatable way so as not to induce negative influences on the study. It also prevents one from controlling accurately a tool with respect to a sample without adding additional sensors for closed loop control. This paper aims at quantifying the positioning repeatability and accuracy based on the ISO 9283:1998 standard, and analyzing factors influencing positioning accuracy onto a case study of 1-DoF (Degree-of-Freedom) nanopositioning stage. The influence of thermal drift is notably quantified. Performances improvement of the nanopositioning stage are then investigated through robot calibration (i.e., open-loop approach). Two models (static and adaptive models) are proposed to compensate for both geometric errors and thermal drift. Validation experiments are conducted over a long period (several days) showing that the accuracy of the stage is improved from typical micrometer range to 400 nm using the static model and even down to 100 nm using the adaptive model. In addition, we extend the 1-DoF calibration to multi-DoF with a case study of a 2-DoF nanopositioning robot. Results demonstrate that the model efficiently improved the 2D accuracy from 1400 nm to 200 nm.

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“…An actuation voltage (v a ) with opposite signs plus a constant dc voltage (V q ) are applied to the opposing electrostatic combs on opposite sides to mitigate the inherent quadratic nonlinearity of the electrostatic actuator. The resulting force is proportional to V q × v a which is linear with respect to the actuation signal (v a ) [11], [25]. During all experiments, a constant voltage of 30 V is used as V q .…”

Section: Differential Piezoresistive Sensormentioning

confidence: 99%

Tilted Beam Piezoresistive Displacement Sensor: Design, Modeling, and Characterization

Maroufi

Bazaei

Mohammadi

et al. 2015

J. Microelectromech. Syst.

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Abstract-We present a comprehensive study of the design, modeling, and characterization of an on-chip piezoresistive displacement sensor. The design is based on the bulk piezoresistivity of tilted clamped-guided beams without the need for additional steps to generate doped regions. The sensor is implemented in a one-degree-of-freedom microelectromechanical system (MEMS) nanopositioner, where the beams also function as the suspension system. A standard MEMS fabrication process is used to realize the device on single-crystalline silicon as the structural material. The beams are oppositely tilted to develop tensile and compressive axial forces during stage movement, creating a differential sensing feature. An analytical approach is proposed for modeling and design of the tilted clamped-guided beams. The linearity of the sensor in the differential configuration is investigated analytically. The static, dynamic, and noise characteristics of the sensor are presented, followed by a model-based investigation of the measured dynamic feedthrough.[ 2015-0030]Index Terms-Piezoresistive displacement sensor, MEMS nanopositioner, tilted clamped-guided beam, buckling, negative stiffness.

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A High-Bandwidth MEMS Nanopositioner for On-Chip AFM: Design, Characterization, and Control

Cited by 40 publications

References 48 publications

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Calibration of Nanopositioning Stages

Tilted Beam Piezoresistive Displacement Sensor: Design, Modeling, and Characterization

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