2012 Symposium on VLSI Technology (VLSIT) 2012
DOI: 10.1109/vlsit.2012.6242476
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A highly pitch scalable 3D vertical gate (VG) NAND flash decoded by a novel self-aligned independently controlled double gate (IDG) string select transistor (SSL)

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Cited by 21 publications
(19 citation statements)
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“…The 3D Vertical Gate (3D VG-type) NAND architecture (Horizontal Channel structure) has been investigated and extensively studied, being the following references only a small example of related publications [8,10,[18][19][20][21][22][23][24][25]. The scalability of the architecture has been studied down to the 2× nm node.…”
Section: Vg-type 3d Nand Architecturementioning
confidence: 99%
“…The 3D Vertical Gate (3D VG-type) NAND architecture (Horizontal Channel structure) has been investigated and extensively studied, being the following references only a small example of related publications [8,10,[18][19][20][21][22][23][24][25]. The scalability of the architecture has been studied down to the 2× nm node.…”
Section: Vg-type 3d Nand Architecturementioning
confidence: 99%
“…Figure 8 shows the recent published 37.5nm half pitch 3D VG NAND [8]. Further pitch scalability seems feasible in this architecture.…”
Section: Processing Feasibilitymentioning
confidence: 99%
“…3D NAND Flash [1][2][3][4][5][6][7][8][9] has attracted much attention in recent years. In principle, 3D NAND Flash allows bigger cell size to relax the device scaling limitation of FG NAND.…”
Section: Introductionmentioning
confidence: 99%
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