A low cost ion beam profile monitor

Godfrey, L. A.; Hoyes, G.; Pairsuwan, W.

doi:10.1016/0168-583x(90)90504-n

Cited by 5 publications

(3 citation statements)

References 1 publication

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“…The beam profile was located 20 cm from the quadrupole. A multiwire profile monitor which has a 3×3 cm 2 active area with 16 × 16, 150 µm tungsten sense-wires was a modified version developed by Godfrey et al [36]. The signals from each sense-wire were read out through external multiplexers to a digital storage oscilloscope for beamwidth determination.…”

Section: Methodsmentioning

confidence: 99%

Characteristics of a 13.56 MHz radiofrequency-driven multicusp ion source

Boonyawan

Chiraphatpimol

Vilaithong

2002

Plasma Sources Sci. Technol.

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The characteristics of a radiofrequency (rf)-driven multicusp ion source are investigated. The ion source is an Nd-Fe-B magnetic multicusp type operated at 13.56 MHz with an internal quartz covered antenna. The source has been diagnosed by an rf-compensated Langmuir probe for uniformity, density and electron temperature. A retarding field energy analyser, and a multi-wire beam profile monitor and quadrupole magnet system have been used for beam energy spread and emittance measurements. Experiments were performed with argon gas and rf power up to 500 W. A plasma density of up to 1.5 × 10 18 m −3 was obtained. The rms beam emittance is found to be about 32 ± 4 mm mrad, and the energy spread of the argon beam is around 3.1 ± 0.5 eV at 3 kV extraction. The rf coupling to the extracting voltage could be suppressed by a 1.2 mH rf choke, which results in the reduction of the axial energy spread in the extracted beam.

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Section: Methodsmentioning

confidence: 99%

Characteristics of a 13.56 MHz radiofrequency-driven multicusp ion source

Boonyawan

Chiraphatpimol

Vilaithong

2002

Plasma Sources Sci. Technol.

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“…Depending on the current and energy of different charged particle beams, various two-dimensional ion beam profile devices have been developed. Among them, scintillation screens, residual gas monitors, wire scanners and secondary electron emission grid are commonly used devices [1][2][3][4].…”

Section: Introductionmentioning

confidence: 99%

Monitoring transverse beam profiles of a Penning ion source using a position-sensitive Multi Array Faraday Cup

Ebrahimibasabi¹,

Feghhi²

2015

J. Inst.

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In this paper, we describe the design and construction of a Multi Array Faraday Cup for both beam profiling and current measurements in a Penning ion source. This diagnostic system includes an array configured from multiple cups electrically isolated from each other to collect charged particles incident on the respective cups. Each cup in the array produces a specific signal corresponding to the collected charges due to the incident charged particles. Collected charges signals are amplified and processed by using an electronic beam monitoring system. A testing setup has been designed for testing and calibration of the system. Experiments have been set up for evaluation of proper functioning of the MAFC in measurement of different beam profiles produced by using the testing set-up. Additionally, total extracted ion current and transverse beam profile has been measured for a Penning ion source.

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“…Fluorescent plate with CCD camera [1], wire scanning [2,3], wire grids [4] and multi Faraday cup [5] have been used to monitor the beam profile, but these methods need somewhat expensive and complex systems. Self-developing dosimetry film is a simple and cost-effective method for monitoring X-rays, c-rays and high energy ion beams [6].…”

Section: Introductionmentioning

confidence: 99%