2004
DOI: 10.1016/j.ssc.2004.05.003
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A low temperature study of electron transport properties of tantalum nitride thin films prepared by ion beam assisted deposition

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Cited by 6 publications
(8 citation statements)
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“…studied the electrical transport properties in polycrystalline Ni films and suggested that the total resistivity could be written as the superposition of tunneling effect and scattering 23 . Hence, the temperature-dependent in our samples might also be given as: Here, the first term represents the resistivity dominated by FIT process and the residual terms are the contribution from temperature-dependent scattering 21 , 24 26 . The T 2 term includes the contribution from magnetic scattering, surface-induced scattering, and electron-electron scattering.…”
Section: Resultsmentioning
confidence: 99%
“…studied the electrical transport properties in polycrystalline Ni films and suggested that the total resistivity could be written as the superposition of tunneling effect and scattering 23 . Hence, the temperature-dependent in our samples might also be given as: Here, the first term represents the resistivity dominated by FIT process and the residual terms are the contribution from temperature-dependent scattering 21 , 24 26 . The T 2 term includes the contribution from magnetic scattering, surface-induced scattering, and electron-electron scattering.…”
Section: Resultsmentioning
confidence: 99%
“…where W is the charging energy. In [18], it is shown that this function describes the resistivity of their Ta x N samples above 20 K. In figure 6, we show that this function does not fit our data. This suggests that, for our samples, columnar zones, if they exist, are not significantly important in the transport.…”
Section: Inhomogeneity Of Samplesmentioning
confidence: 56%
“…The extracted values of m are plotted in the inset to figure 8. Our data (closed circles) are compared with the results from [18]. Both sets of the data show that the data are mutually comparable and that m decreases with decreasing x.…”
Section: Electron-electron Scatteringmentioning
confidence: 86%
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“…However, numerous experimental results show TaN x in the rocksalt structure has negative temperature coefficient of resistivity (TCR, here TCR is defined as dρ/(ρdT ), and ρ is the resistivity at a certain temperature T ) [5,12], and the origins of the negative TCR is still debatable. Tiwari et al ascribed the negative TCR of TaN films to weaklocalization effect [13], while the hopping conduction and electron-electron (e-e) interaction effect were considered as the origins by other groups [14,15]. Thus further investigations on the fundamental properties, especially * Corresponding author, e-mail: zhiqingli@tju.edu.cn with regard to the electrical transport properties, are still needed for the TaN x compounds.…”
Section: Introductionmentioning
confidence: 99%