2008
DOI: 10.1016/j.sna.2007.11.027
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A micrometer scale and low temperature PZT thick film MEMS process utilizing an aerosol deposition method

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Cited by 49 publications
(26 citation statements)
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“…Fabricating the PZT layer using an aerosol deposition method has been proven to be a quick, efficient and easy-to-pattern MEMS process [42,43]. The aerosol deposition equipment deposited PZT film up to 0.1 micrometer per minute.…”
Section: Pzt Deposition Methodsmentioning
confidence: 99%
“…Fabricating the PZT layer using an aerosol deposition method has been proven to be a quick, efficient and easy-to-pattern MEMS process [42,43]. The aerosol deposition equipment deposited PZT film up to 0.1 micrometer per minute.…”
Section: Pzt Deposition Methodsmentioning
confidence: 99%
“…Wang et al (27) developed the integration of bulk PZT and silicon by Cytop, a patternable bond layer, and the thinning of bulk PZT by the chemical mechanical polishing method. Bonding processes must ensure the precision of the designed structure.…”
Section: Conductive Epoxy As the Bonding Layer For Direct Bondingmentioning
confidence: 99%
“…The fabricated harvester device produces 14.0 μW with an optimal resistive load of 100 kΩ from 1g input acceleration at its resonant frequency of 235 Hz. A sintering temperature above 550 ℃ can provide high piezoelectricity, (27) which limits the application of the subsequent MEMS fabrication process. However, bulk PZT ceramics provide higher electromechanical coupling and harvesting efficiency than deposited piezoelectric thin films.…”
Section: Introductionmentioning
confidence: 99%
“…In MEMS technology, most of the devices are developed using the micromachined silicon structures [1]. Combination of micromachined silicon with piezoelectric films leads to the novel microdevices [2,3].…”
Section: Introductionmentioning
confidence: 99%